XPS Depth Profile Analysis of Zn₃N₂ Thin Films Grown at Different N₂/Ar Gas Flow Rates by RF Magnetron Sputtering

Engineering

• Gas Flowrate 100%
• Depth Profile 100%
• Thin Films 100%
• Magnetron 100%
• Secondary Phase 50%
• Flow Rate 50%
• Nitride 50%
• Semiconductor Type 50%
• Fused Silica 50%
• Carrier Concentration 50%
• Average Grain Size 50%
• Average Surface Roughness 50%
• Substrates 50%
• Surface 50%
• Measurement 50%
• Surface Morphology 50%
• Radio Frequency 50%
• Polycrystalline 50%
• Photoelectron 50%

Material Science

• Magnetron Sputtering 100%
• Film 100%
• Gas Flow 100%
• Thin Films 100%
• ZnO 66%
• Nitride Compound 33%
• Carrier Concentration 33%
• Surface Morphology 33%
• Semiconductor Material 33%
• Surface Roughness 33%
• Grain Size 33%
• Hall Mobility 33%
• Surface 33%
• Silicon Dioxide 33%