X-ray absorption near edge structure investigation of vanadium-doped ZnO thin films

  • M. Faiz*
  • , N. Tabet
  • , A. Mekki
  • , B. S. Mun
  • , Z. Hussain
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

X-ray absorption near edge structure spectroscopy has been used to investigate the electronic and atomic structure of vanadium-doped ZnO thin films obtained by reactive plasma. The results show no sign of metallic clustering of V atoms, +4 oxidation state of V, 4-fold coordination of Zn in the films, and a secondary phase (possibly VO2) formation at 15% V doping. O K edge spectra show V 3d-O 2p and Zn 4d-O 2p hybridization, and suggest that V4+ acts as electron donor that fills the σ* band.

Original languageEnglish
Pages (from-to)1377-1379
Number of pages3
JournalThin Solid Films
Volume515
Issue number4
DOIs
StatePublished - 5 Dec 2006

Bibliographical note

Funding Information:
This work was partially supported by the US Department of Energy under contract number DE-AC03-76F00098. Faiz, Tabet and Mekki would like to thank KFUPM for its support.

Keywords

  • DC-sputtering
  • Thin films
  • Vanadium doping
  • XANES
  • ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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