Abstract
X-ray absorption near edge structure spectroscopy has been used to investigate the electronic and atomic structure of vanadium-doped ZnO thin films obtained by reactive plasma. The results show no sign of metallic clustering of V atoms, +4 oxidation state of V, 4-fold coordination of Zn in the films, and a secondary phase (possibly VO2) formation at 15% V doping. O K edge spectra show V 3d-O 2p and Zn 4d-O 2p hybridization, and suggest that V4+ acts as electron donor that fills the σ* band.
| Original language | English |
|---|---|
| Pages (from-to) | 1377-1379 |
| Number of pages | 3 |
| Journal | Thin Solid Films |
| Volume | 515 |
| Issue number | 4 |
| DOIs | |
| State | Published - 5 Dec 2006 |
Bibliographical note
Funding Information:This work was partially supported by the US Department of Energy under contract number DE-AC03-76F00098. Faiz, Tabet and Mekki would like to thank KFUPM for its support.
Keywords
- DC-sputtering
- Thin films
- Vanadium doping
- XANES
- ZnO
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry