Ultraviolet and laser irradiation effects on various batches of CR-39

  • F. Abu-Jarad*
  • , M. A. Islam
  • , I. Abu-Abdoun
  • , M. A. Khan
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Different batches of CR-39 were irradiated with various ultraviolet (UV) sources and an excimer laser (γ=308). A visible change of color of detectors under heavy doses appeared in both cases. The exposure to ordinary (non-linear) UV light sources resulted in an increase of the track sizes, bulk and track etch rate in two different wavelengths 254 nm and 350 nm. While at 300 nm no increase was observed. On the other hand, the exposure to the laser resulted in hardening of the surfaces and therefore a decreasing of track sizes. The laser effect (hardening) was, however, found to saturate above a certain exposure dose. The observed hardening of laser irradiated detectors suggests their possible use in the detection and study of ultra energetic particles without unnecessarily increasing the thickness of the detectors.

Original languageEnglish
Pages (from-to)135-138
Number of pages4
JournalInternational Journal of Radiation Applications and Instrumentation. Part
Volume19
Issue number1-4
DOIs
StatePublished - 1991

Bibliographical note

Funding Information:
This study was supported by the Major Science and Technology Program for Water Pollution Control and Management (No. 2013ZX07201007, 2014ZX07201012), the State Key Laboratory of Urban Water Resource and Environment, Harbin Institute of Technology (No. 2014DX03) and the Science Fund for Distinguished Young Scholars of Heilongjiang Province (JC201303). The authors also appreciate the Open Project of State Key Laboratory of Urban Water Resource and Environment, Harbin Institute of Technology (QA201609-02), the Heilongjiang Postdoctoral Science Foundation (LBH-Z14093) and the Fundamental Research Funds for the Central Universities (Grant No. HIT.NSRIF. 2015096).

Keywords

  • CR-39
  • Ultraviolet
  • bulk and track etch rate
  • different wavelengths
  • excimer laser

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