Abstract
The development of high-performance photocatalysts for CO2 reduction to CH4 has garnered significant attention. Graphitic carbon nitride (g-C3N4) is a promising photocatalyst; however, its performance is hindered by poor charge separation and low reaction kinetics. Tailoring its adsorption capacity, crystallinity, and electronic properties can effectively address these limitations. In this study, we synthesized a g-C3N4 photocatalyst with optimized adsorption capacity, crystallinity, and electronic density through simultaneous P and K doping for efficient CO2 photoreduction. The Pa-K-CN photocatalyst exhibited enhanced charge separation, light harvesting, CO2 adsorption, crystallinity, and electronic density, thereby promoting CH4 production. The P0.05-K-CN sample achieved a maximal CH4 yield of 19.34 μmol/g/h with 92.8 % selectivity, nearly 22 times higher than that of pure CN. Characterization and theoretical results revealed that P-substituted C atoms in heptazine rings boosted CO2 adsorption, enhanced charge separation, and contributed to cyano group formation, whereas K doping between CN layers increased crystallinity, charge transfer, electronic density and further promoting cyano group formation. In-situ DRIFTS and DFT calculations elucidated the reaction pathways and identified *CHO as the key intermediate and the rate-determining step in CH4 formation. This paper presents an innovative technique for developing g-C3N4 photocatalysts with superior adsorption capacity, crystallinity, and localized electron density for efficient CO2 reduction to value-added products.
| Original language | English |
|---|---|
| Article number | 163023 |
| Journal | Chemical Engineering Journal |
| Volume | 513 |
| DOIs | |
| State | Published - 1 Jun 2025 |
| Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2025
Keywords
- CH selectivity
- CO reduction
- Cyano groups
- Heteroatom doping
ASJC Scopus subject areas
- Environmental Chemistry
- General Chemistry
- General Chemical Engineering
- Industrial and Manufacturing Engineering