Sub-15 nm nano-pattern generation by spacer width control for high density precisely positioned self-assembled device nanomanufacturing

Engineering

• Nanomanufacturing System 100%
• Base Structure 100%
• Side Wall 66%
• Nitride 33%
• Complementary Metal-Oxide-Semiconductor 33%
• Microfabrication 33%
• Position Control 33%
• Nanoelectronics 33%
• High Integration Density 33%
• Nodes 33%
• Optical Lithography 33%
• Thin Films 33%

Material Science

• Density 100%
• Silicon Nitride 66%
• Device Integration 33%
• Nanodevices 33%
• Microfabrication 33%
• Lithography 33%
• Complementary Metal-Oxide-Semiconductor Device 33%
• Reactive Ion Etching 33%
• Thin Films 33%