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Study of electron-beam evaporated Sn-doped In2O3 films

  • S. M.A. Durrani*
  • , E. E. Khawaja
  • , J. Shirokoff
  • , M. A. Daous
  • , G. D. Khattak
  • , M. A. Salim
  • , M. S. Hussain
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

Electron beam evaporated Sn-doped In2O3 films have been prepared from the starting material with composition of (1 - x) In2O3 - -x SnO2, where x=0.0, 0.010, 0.025, 0.050, 0.090, and 0.120. X-ray photoelectron spectroscopy, Rutherford backscattering spectrometry, and X-ray diffraction analysis were carried out on the films. Luminous transmittance and electrical resistivity of the films, show weak dependence on x. The composition of the film ([Sn]/[In] atomic ratio) was found to differ from that of the starting material. In fact, the atomic ratio was higher in the film than in the starting material by a factor which increases with x (ranging from 1.0 to 2.6). There is a relatively broad resistivity minimum in the layer atomic ratio range Sn/In=0.06 - -0.09. These results compare well with those reported in the literature for Sn-doped In2O3 films, prepared by pyrolitic (spray) method.

Original languageEnglish
Pages (from-to)37-47
Number of pages11
JournalSolar Energy Materials and Solar Cells
Volume44
Issue number1
DOIs
StatePublished - 30 Oct 1996

Bibliographical note

Funding Information:
This work is part of KFUPM/RI project LRL supported by the King Fahd University of Petroleum and Minerals.

Keywords

  • Atomic ratio
  • Electron beam evaporation
  • Resistivity minimum
  • Sn-doped InO films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

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