Abstract
Electron beam evaporated Sn-doped In2O3 films have been prepared from the starting material with composition of (1 - x) In2O3 - -x SnO2, where x=0.0, 0.010, 0.025, 0.050, 0.090, and 0.120. X-ray photoelectron spectroscopy, Rutherford backscattering spectrometry, and X-ray diffraction analysis were carried out on the films. Luminous transmittance and electrical resistivity of the films, show weak dependence on x. The composition of the film ([Sn]/[In] atomic ratio) was found to differ from that of the starting material. In fact, the atomic ratio was higher in the film than in the starting material by a factor which increases with x (ranging from 1.0 to 2.6). There is a relatively broad resistivity minimum in the layer atomic ratio range Sn/In=0.06 - -0.09. These results compare well with those reported in the literature for Sn-doped In2O3 films, prepared by pyrolitic (spray) method.
| Original language | English |
|---|---|
| Pages (from-to) | 37-47 |
| Number of pages | 11 |
| Journal | Solar Energy Materials and Solar Cells |
| Volume | 44 |
| Issue number | 1 |
| DOIs | |
| State | Published - 30 Oct 1996 |
Bibliographical note
Funding Information:This work is part of KFUPM/RI project LRL supported by the King Fahd University of Petroleum and Minerals.
Keywords
- Atomic ratio
- Electron beam evaporation
- Resistivity minimum
- Sn-doped InO films
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
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