Structure of Ti1-xTaxN thin films prepared by DC-magnetron sputtering

O. Bourbia; N. Guerfi; S. Achour; N. Tabet; A. Mosser

doi:10.4028/0-87849-962-8.387

Structure of Ti_1-xTa_xN thin films prepared by DC-magnetron sputtering

O. Bourbia^*
, N. Guerfi
, S. Achour
, N. Tabet
, A. Mosser

^*Corresponding author for this work

King Fahd University of Petroleum & Minerals

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM) were used to investigate the effect of tantalum addition on the TiN thin films structure. Both the HRTEM and selected area electron diffraction have showed that the films possess a fine grained polycrystalline structure with an average grain size in the order of 10 nm. The chemical composition of the films was determined by the use of the Ti2p, N1s and Ta4f core level peaks. The analysis of Ta4f core level revealed the presence of Ta-N bond indicating that tantalum atoms can occupy the titanium sublattice sites. Moreover, the XPS spectra revealed the presence of Ta₂O ₅ in the films.

Original language	English
Title of host publication	Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003)
Publisher	Trans Tech Publications Ltd
Pages	387-392
Number of pages	6
ISBN (Print)	0878499628, 9780878499625
DOIs	https://doi.org/10.4028/0-87849-962-8.387
State	Published - 2005

Publication series

Name	Materials Science Forum
Volume	480-481
ISSN (Print)	0255-5476
ISSN (Electronic)	1662-9752

Keywords

DC magnetron sputtering
HRTEM
Structure
XPS

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.4028/0-87849-962-8.387

Cite this

Bourbia, O., Guerfi, N., Achour, S., Tabet, N., & Mosser, A. (2005). Structure of Ti_1-xTa_xN thin films prepared by DC-magnetron sputtering. In Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003) (pp. 387-392). (Materials Science Forum; Vol. 480-481). Trans Tech Publications Ltd. https://doi.org/10.4028/0-87849-962-8.387

@inproceedings{d32855fbbef24a49aa97ee72dc994d85,

title = "Structure of Ti1-xTaxN thin films prepared by DC-magnetron sputtering",

abstract = "X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM) were used to investigate the effect of tantalum addition on the TiN thin films structure. Both the HRTEM and selected area electron diffraction have showed that the films possess a fine grained polycrystalline structure with an average grain size in the order of 10 nm. The chemical composition of the films was determined by the use of the Ti2p, N1s and Ta4f core level peaks. The analysis of Ta4f core level revealed the presence of Ta-N bond indicating that tantalum atoms can occupy the titanium sublattice sites. Moreover, the XPS spectra revealed the presence of Ta2O 5 in the films.",

keywords = "DC magnetron sputtering, HRTEM, Structure, XPS",

author = "O. Bourbia and N. Guerfi and S. Achour and N. Tabet and A. Mosser",

year = "2005",

doi = "10.4028/0-87849-962-8.387",

language = "English",

isbn = "0878499628",

series = "Materials Science Forum",

publisher = "Trans Tech Publications Ltd",

pages = "387--392",

booktitle = "Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003)",

}

Bourbia, O, Guerfi, N, Achour, S, Tabet, N & Mosser, A 2005, Structure of Ti_1-xTa_xN thin films prepared by DC-magnetron sputtering. in Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003). Materials Science Forum, vol. 480-481, Trans Tech Publications Ltd, pp. 387-392. https://doi.org/10.4028/0-87849-962-8.387

Structure of Ti_1-xTa_xN thin films prepared by DC-magnetron sputtering. / Bourbia, O.; Guerfi, N.; Achour, S. et al.
Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003). Trans Tech Publications Ltd, 2005. p. 387-392 (Materials Science Forum; Vol. 480-481).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Structure of Ti1-xTaxN thin films prepared by DC-magnetron sputtering

AU - Bourbia, O.

AU - Guerfi, N.

AU - Achour, S.

AU - Tabet, N.

AU - Mosser, A.

PY - 2005

Y1 - 2005

N2 - X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM) were used to investigate the effect of tantalum addition on the TiN thin films structure. Both the HRTEM and selected area electron diffraction have showed that the films possess a fine grained polycrystalline structure with an average grain size in the order of 10 nm. The chemical composition of the films was determined by the use of the Ti2p, N1s and Ta4f core level peaks. The analysis of Ta4f core level revealed the presence of Ta-N bond indicating that tantalum atoms can occupy the titanium sublattice sites. Moreover, the XPS spectra revealed the presence of Ta2O 5 in the films.

AB - X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM) were used to investigate the effect of tantalum addition on the TiN thin films structure. Both the HRTEM and selected area electron diffraction have showed that the films possess a fine grained polycrystalline structure with an average grain size in the order of 10 nm. The chemical composition of the films was determined by the use of the Ti2p, N1s and Ta4f core level peaks. The analysis of Ta4f core level revealed the presence of Ta-N bond indicating that tantalum atoms can occupy the titanium sublattice sites. Moreover, the XPS spectra revealed the presence of Ta2O 5 in the films.

KW - DC magnetron sputtering

KW - HRTEM

KW - Structure

KW - XPS

UR - https://www.scopus.com/pages/publications/35048848007

U2 - 10.4028/0-87849-962-8.387

DO - 10.4028/0-87849-962-8.387

M3 - Conference contribution

AN - SCOPUS:35048848007

SN - 0878499628

SN - 9780878499625

T3 - Materials Science Forum

SP - 387

EP - 392

BT - Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003)

PB - Trans Tech Publications Ltd

ER -

Bourbia O, Guerfi N, Achour S, Tabet N, Mosser A. Structure of Ti_1-xTa_xN thin films prepared by DC-magnetron sputtering. In Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003). Trans Tech Publications Ltd. 2005. p. 387-392. (Materials Science Forum). doi: 10.4028/0-87849-962-8.387