Structural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas

Jitendra Menda; Benjamin Ulmen; Lakshman K. Vanga; Vijaya K. Kayastha; Yoke Khin Yap; Zhengwei Pan; Ilia N. Ivanov; Alex A. Puretzky; David B. Geohegan

doi:10.1063/1.2115068

Structural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas

Jitendra Menda
, Benjamin Ulmen
, Lakshman K. Vanga
, Vijaya K. Kayastha
, Yoke Khin Yap^*
, Zhengwei Pan
, Ilia N. Ivanov
, Alex A. Puretzky
, David B. Geohegan

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.

Original language	English
Article number	173106
Pages (from-to)	1-3
Number of pages	3
Journal	Applied Physics Letters
Volume	87
Issue number	17
DOIs	https://doi.org/10.1063/1.2115068
State	Published - 24 Oct 2005
Externally published	Yes

Bibliographical note

Funding Information:
One of the authors (Y.K.Y.) acknowledges support from the Michigan Tech Research Excellence Fund, the Department of the Army (Grant No. W911NF-04-1-0029, through the City College of New York), and the Center for Nanophase Materials Sciences sponsored by the Division of Materials Sciences and Engineering, U.S. Department of Energy, under Contract No. DE-AC05-00OR22725 with UT-Battelle, LLC.

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2115068

Cite this

@article{41e359975f314fae81f41c208aa70ae8,

title = "Structural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas",

abstract = "Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.",

author = "Jitendra Menda and Benjamin Ulmen and Vanga, \{Lakshman K.\} and Kayastha, \{Vijaya K.\} and Yap, \{Yoke Khin\} and Zhengwei Pan and Ivanov, \{Ilia N.\} and Puretzky, \{Alex A.\} and Geohegan, \{David B.\}",

note = "Funding Information: One of the authors (Y.K.Y.) acknowledges support from the Michigan Tech Research Excellence Fund, the Department of the Army (Grant No. W911NF-04-1-0029, through the City College of New York), and the Center for Nanophase Materials Sciences sponsored by the Division of Materials Sciences and Engineering, U.S. Department of Energy, under Contract No. DE-AC05-00OR22725 with UT-Battelle, LLC. ",

year = "2005",

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doi = "10.1063/1.2115068",

language = "English",

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T1 - Structural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas

AU - Menda, Jitendra

AU - Ulmen, Benjamin

AU - Vanga, Lakshman K.

AU - Kayastha, Vijaya K.

AU - Yap, Yoke Khin

AU - Pan, Zhengwei

AU - Ivanov, Ilia N.

AU - Puretzky, Alex A.

AU - Geohegan, David B.

N1 - Funding Information: One of the authors (Y.K.Y.) acknowledges support from the Michigan Tech Research Excellence Fund, the Department of the Army (Grant No. W911NF-04-1-0029, through the City College of New York), and the Center for Nanophase Materials Sciences sponsored by the Division of Materials Sciences and Engineering, U.S. Department of Energy, under Contract No. DE-AC05-00OR22725 with UT-Battelle, LLC.

PY - 2005/10/24

Y1 - 2005/10/24

N2 - Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.

AB - Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.

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JF - Applied Physics Letters

IS - 17

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ER -

Structural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas

Abstract

Bibliographical note

ASJC Scopus subject areas

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