TY - JOUR
T1 - Photolithography-enabled direct patterning of liquid metals
AU - Abbasi, Roozbeh
AU - Mayyas, Mohannad
AU - Ghasemian, Mohammad B.
AU - Centurion, Franco
AU - Yang, Jiong
AU - Saborio, Maricruz
AU - Allioux, Francois Marie
AU - Han, Jialuo
AU - Tang, Jianbo
AU - Christoe, Michael J.
AU - Mohibul Kabir, K. M.
AU - Kalantar-Zadeh, Kourosh
AU - Rahim, Md Arifur
N1 - Publisher Copyright:
© The Royal Society of Chemistry.
PY - 2020/6/21
Y1 - 2020/6/21
N2 - One of the major challenges in the development of soft electronics is to devise scalable and automated strategies for the microfabrication of deformable and flexible electronic components and sensors. Liquid metals have demonstrated unique characteristics suitable for such applications. To date, conductive patterning using liquid metals has mainly focused on writing or injection of liquid metals into prefabricated channels, requiring multiple complicated procedures and reliance on specific inks formulae. Here a new strategy has been introduced for direct patterning of liquid metal particles onto substrates via UV photolithography. A variety of different tracks, patterns and sensors, on both rigid and flexible substrates, are demonstrated using a dispersion of eutectic alloy of gallium and indium in photoresist, to present the extent of capability of the introduced method. The method provides simple, effective, high-resolution and precision patterning of liquid metals for the emerging fields of soft electronics and sensors.
AB - One of the major challenges in the development of soft electronics is to devise scalable and automated strategies for the microfabrication of deformable and flexible electronic components and sensors. Liquid metals have demonstrated unique characteristics suitable for such applications. To date, conductive patterning using liquid metals has mainly focused on writing or injection of liquid metals into prefabricated channels, requiring multiple complicated procedures and reliance on specific inks formulae. Here a new strategy has been introduced for direct patterning of liquid metal particles onto substrates via UV photolithography. A variety of different tracks, patterns and sensors, on both rigid and flexible substrates, are demonstrated using a dispersion of eutectic alloy of gallium and indium in photoresist, to present the extent of capability of the introduced method. The method provides simple, effective, high-resolution and precision patterning of liquid metals for the emerging fields of soft electronics and sensors.
UR - https://www.scopus.com/pages/publications/85086901884
U2 - 10.1039/d0tc01466d
DO - 10.1039/d0tc01466d
M3 - Article
AN - SCOPUS:85086901884
SN - 2050-7534
VL - 8
SP - 7805
EP - 7811
JO - Journal of Materials Chemistry C
JF - Journal of Materials Chemistry C
IS - 23
ER -
