Optimization of multilayer mirrors at 13:4nm with more than two materials

S. M. Al-Marzoug; R. J.W. Hodgson

doi:10.1364/AO.47.002155

Optimization of multilayer mirrors at 13:4nm with more than two materials

S. M. Al-Marzoug, R. J.W. Hodgson

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

The design of multilayer mirrors with more than two materials is one of the key technologies for investigating lithography. We study a new procedure for optimizing multilayer mirrors of different combinations of materials at a wavelength of 13:4nm. By adding Be and C layers in different orders to a Si/Mo stack, we have observed enhancement of the reflectivity and a reduction in the number of layers. The Luus-Jaakola optimization procedure has been implemented for the global optimization of the multilayer mirrors. With this algorithm it is not necessary to specify initially the number of layers present in a given design.

Original language	English
Pages (from-to)	2155-2160
Number of pages	6
Journal	Applied Optics
Volume	47
Issue number	12
DOIs	https://doi.org/10.1364/AO.47.002155
State	Published - 20 Apr 2008
Externally published	Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Electrical and Electronic Engineering

Access to Document

10.1364/AO.47.002155

Cite this

@article{7899ae591b3b4ed4809fb6a6ffad6860,

title = "Optimization of multilayer mirrors at 13:4nm with more than two materials",

abstract = "The design of multilayer mirrors with more than two materials is one of the key technologies for investigating lithography. We study a new procedure for optimizing multilayer mirrors of different combinations of materials at a wavelength of 13:4nm. By adding Be and C layers in different orders to a Si/Mo stack, we have observed enhancement of the reflectivity and a reduction in the number of layers. The Luus-Jaakola optimization procedure has been implemented for the global optimization of the multilayer mirrors. With this algorithm it is not necessary to specify initially the number of layers present in a given design.",

author = "Al-Marzoug, \{S. M.\} and Hodgson, \{R. J.W.\}",

year = "2008",

month = apr,

day = "20",

doi = "10.1364/AO.47.002155",

language = "English",

volume = "47",

pages = "2155--2160",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "Optica Publishing Group",

number = "12",

}

TY - JOUR

T1 - Optimization of multilayer mirrors at 13:4nm with more than two materials

AU - Al-Marzoug, S. M.

AU - Hodgson, R. J.W.

PY - 2008/4/20

Y1 - 2008/4/20

N2 - The design of multilayer mirrors with more than two materials is one of the key technologies for investigating lithography. We study a new procedure for optimizing multilayer mirrors of different combinations of materials at a wavelength of 13:4nm. By adding Be and C layers in different orders to a Si/Mo stack, we have observed enhancement of the reflectivity and a reduction in the number of layers. The Luus-Jaakola optimization procedure has been implemented for the global optimization of the multilayer mirrors. With this algorithm it is not necessary to specify initially the number of layers present in a given design.

AB - The design of multilayer mirrors with more than two materials is one of the key technologies for investigating lithography. We study a new procedure for optimizing multilayer mirrors of different combinations of materials at a wavelength of 13:4nm. By adding Be and C layers in different orders to a Si/Mo stack, we have observed enhancement of the reflectivity and a reduction in the number of layers. The Luus-Jaakola optimization procedure has been implemented for the global optimization of the multilayer mirrors. With this algorithm it is not necessary to specify initially the number of layers present in a given design.

UR - https://www.scopus.com/pages/publications/61849166011

U2 - 10.1364/AO.47.002155

DO - 10.1364/AO.47.002155

M3 - Article

AN - SCOPUS:61849166011

SN - 1559-128X

VL - 47

SP - 2155

EP - 2160

JO - Applied Optics

JF - Applied Optics

IS - 12

ER -

Optimization of multilayer mirrors at 13:4nm with more than two materials

Abstract

ASJC Scopus subject areas

Access to Document

Fingerprint

Cite this