Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate

M. S.H. Choudhury; Shah Ridwan Ahmed; Md Munirul Islam Tusher; Muhammad Athar Uddin; M. Shafiul Alam; T. Soga

doi:10.1109/ICISET.2018.8745573

Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate

M. S.H. Choudhury, Shah Ridwan Ahmed, Md Munirul Islam Tusher, Muhammad Athar Uddin, M. Shafiul Alam, T. Soga

Applied Research Center for Environment and Marine Studies

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Abstract

In this investigation, electrophoretic deposition of Titanium Oxide (P25) nanoparticles on Fluorine doped Tin Oxide (FTO) substrate has been studied. Three deposition parameters such as deposition time, deposition distance, and deposition voltage have been varied to get a uniform metal-oxide layer. The rate of deposition has been observed by varying those three parameters. Rate of deposition clearly increases as an effect of increasing deposition time and voltage. On the other hand, rate of deposition decreases by increasing the distance between the substrates. Surface morphology image shows that huge amount of cracks are formed while the amount of deposition increases beyond a certain level. By observing the surface morphology, optimized deposition parameters have been proposed for the deposition of TiO₂ for thick microfilm application.

Original language	English
Title of host publication	2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	294-298
Number of pages	5
ISBN (Electronic)	9781538685242
DOIs	https://doi.org/10.1109/ICISET.2018.8745573
State	Published - Oct 2018

Publication series

Name	2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018

Bibliographical note

Publisher Copyright:
© 2018 IEEE.

Keywords

Deposition Parameter
Electrophoretic Deposition
Titanium Oxide

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Computer Networks and Communications
Computer Science Applications
Energy Engineering and Power Technology
Electrical and Electronic Engineering

Access to Document

10.1109/ICISET.2018.8745573

Cite this

Choudhury, M. S. H., Ahmed, S. R., Munirul Islam Tusher, M., Uddin, M. A., Shafiul Alam, M., & Soga, T. (2018). Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate. In 2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018 (pp. 294-298). Article 8745573 (2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICISET.2018.8745573

Choudhury, M. S.H. ; Ahmed, Shah Ridwan ; Munirul Islam Tusher, Md et al. / Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate. 2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018. Institute of Electrical and Electronics Engineers Inc., 2018. pp. 294-298 (2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018).

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title = "Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate",

abstract = "In this investigation, electrophoretic deposition of Titanium Oxide (P25) nanoparticles on Fluorine doped Tin Oxide (FTO) substrate has been studied. Three deposition parameters such as deposition time, deposition distance, and deposition voltage have been varied to get a uniform metal-oxide layer. The rate of deposition has been observed by varying those three parameters. Rate of deposition clearly increases as an effect of increasing deposition time and voltage. On the other hand, rate of deposition decreases by increasing the distance between the substrates. Surface morphology image shows that huge amount of cracks are formed while the amount of deposition increases beyond a certain level. By observing the surface morphology, optimized deposition parameters have been proposed for the deposition of TiO2 for thick microfilm application.",

keywords = "Deposition Parameter, Electrophoretic Deposition, Titanium Oxide",

author = "Choudhury, \{M. S.H.\} and Ahmed, \{Shah Ridwan\} and \{Munirul Islam Tusher\}, Md and Uddin, \{Muhammad Athar\} and \{Shafiul Alam\}, M. and T. Soga",

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language = "English",

series = "2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018",

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Choudhury, MSH, Ahmed, SR, Munirul Islam Tusher, M, Uddin, MA, Shafiul Alam, M & Soga, T 2018, Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate. in 2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018., 8745573, 2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018, Institute of Electrical and Electronics Engineers Inc., pp. 294-298. https://doi.org/10.1109/ICISET.2018.8745573

Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate. / Choudhury, M. S.H.; Ahmed, Shah Ridwan; Munirul Islam Tusher, Md et al.
2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018. Institute of Electrical and Electronics Engineers Inc., 2018. p. 294-298 8745573 (2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Choudhury, M. S.H.

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N2 - In this investigation, electrophoretic deposition of Titanium Oxide (P25) nanoparticles on Fluorine doped Tin Oxide (FTO) substrate has been studied. Three deposition parameters such as deposition time, deposition distance, and deposition voltage have been varied to get a uniform metal-oxide layer. The rate of deposition has been observed by varying those three parameters. Rate of deposition clearly increases as an effect of increasing deposition time and voltage. On the other hand, rate of deposition decreases by increasing the distance between the substrates. Surface morphology image shows that huge amount of cracks are formed while the amount of deposition increases beyond a certain level. By observing the surface morphology, optimized deposition parameters have been proposed for the deposition of TiO2 for thick microfilm application.

AB - In this investigation, electrophoretic deposition of Titanium Oxide (P25) nanoparticles on Fluorine doped Tin Oxide (FTO) substrate has been studied. Three deposition parameters such as deposition time, deposition distance, and deposition voltage have been varied to get a uniform metal-oxide layer. The rate of deposition has been observed by varying those three parameters. Rate of deposition clearly increases as an effect of increasing deposition time and voltage. On the other hand, rate of deposition decreases by increasing the distance between the substrates. Surface morphology image shows that huge amount of cracks are formed while the amount of deposition increases beyond a certain level. By observing the surface morphology, optimized deposition parameters have been proposed for the deposition of TiO2 for thick microfilm application.

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Choudhury MSH, Ahmed SR, Munirul Islam Tusher M, Uddin MA, Shafiul Alam M, Soga T. Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate. In 2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018. Institute of Electrical and Electronics Engineers Inc. 2018. p. 294-298. 8745573. (2018 International Conference on Innovations in Science, Engineering and Technology, ICISET 2018). doi: 10.1109/ICISET.2018.8745573

Optimization of Electrophoretic Deposition Parameters for Uniform Titanium Oxide Deposition on Conductive Glass Substrate

Abstract

Publication series

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

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