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Optimization of abrasive slurry assisted rotating ultrasonic machining for enhanced micro-channel fabrication on ceramic silicon wafer (111)

  • Mohit Vishnoi
  • , Siddharth Srivastava
  • , Mamatha Theetha Gangadhar
  • , Vikrant Singh
  • , Vansh Malik
  • , Anuj Bansal*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

This study examined the impact of abrasive slurry assisted Rotating Ultrasonic Machining (RUM) using Boron Carbide (B4C) powder of three mesh sizes: 400 Mesh, 600 Mesh, and 800 Mesh. The effects of abrasive size, feed rate, and tool rotation on Material Removal Rate (MRR) and Surface Roughness (SR) were investigated. The highest MRR of 3.454 mm³/min was achieved with 400 mesh, 30 mm/min feed rate, and 1250 rpm due to larger abrasive size, medium feed rate, and medium tool rotation velocity, while the lowest MRR of 0.284 mm³/min was noted with 600 mesh, 30 mm/min feed rate, and 1500 rpm, attributed to intermediate abrasive size and high tool rotation. The lowest SR of 1.16 μm was observed at 800 mesh, 15 mm/min feed rate, and 1500 rpm, resulting from smaller abrasive size and higher tool rotation facilitating polishing action and vibrational dampening. The highest SR of 3.71 μm occurred at 400 mesh, 45 mm/min feed rate, and 1500 rpm, due to larger abrasive size, higher feed rate, and tool rotation, increasing surface corrosion. ANOVA and regression analyses highlighted mesh size as the most significant parameter for both MRR and SR, with strong model-experimental value correlations. The findings demonstrate the suitability of abrasive slurry assisted RUM for fabricating micro-channels in X-Ray, optoelectronic, and semiconductor applications.

Original languageEnglish
Pages (from-to)52314-52329
Number of pages16
JournalCeramics International
Volume50
Issue number24
DOIs
StatePublished - 15 Dec 2024

Bibliographical note

Publisher Copyright:
© 2024 Elsevier Ltd and Techna Group S.r.l.

Keywords

  • Boron carbide
  • Material removal rate
  • Micro channel fabrication
  • Rotary ultrasonic machining
  • Silicon wafer (111)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

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