Optical properties of erbium oxide thin films deposited by electron beam evaporation

M. F. Al-Kuhaili; S. M.A. Durrani

doi:10.1016/j.tsf.2006.08.048

Optical properties of erbium oxide thin films deposited by electron beam evaporation

M. F. Al-Kuhaili^*
, S. M.A. Durrani

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

29 Scopus citations

Abstract

Erbium oxide thin films were deposited by electron beam evaporation on substrates heated to 300 °C. The effect of the introduction of oxygen on the structural, chemical and optical properties of the films was investigated. The films were characterized using X-ray diffraction, X-ray photoelectron spectroscopy and normal-incidence transmittance and reflectance. The films had microcrystallites embedded in an amorphous matrix, and their stoichiometry was dependent on the oxygen partial pressure. The transmittance spectra of the films revealed that they were optically inhomogeneous. A model based on an inhomogeneous layer was applied to extract the refractive index and extinction coefficient from the transmittance and reflectance spectra.

Original language	English
Pages (from-to)	2885-2890
Number of pages	6
Journal	Thin Solid Films
Volume	515
Issue number	5
DOIs	https://doi.org/10.1016/j.tsf.2006.08.048
State	Published - 22 Jan 2007

Bibliographical note

Funding Information:
The authors acknowledge the support of this work by the Physics Department and the Research Institute of KFUPM. The assistance of Dr. E. E. Khawaja with the numerical calculations is also appreciated.

Keywords

Erbium oxide
Inhomogeneous films
Optical coatings
Optical properties

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2006.08.048

Cite this

@article{14e64b5db9dc4b0fa8d95a5d685d90a8,

title = "Optical properties of erbium oxide thin films deposited by electron beam evaporation",

abstract = "Erbium oxide thin films were deposited by electron beam evaporation on substrates heated to 300 °C. The effect of the introduction of oxygen on the structural, chemical and optical properties of the films was investigated. The films were characterized using X-ray diffraction, X-ray photoelectron spectroscopy and normal-incidence transmittance and reflectance. The films had microcrystallites embedded in an amorphous matrix, and their stoichiometry was dependent on the oxygen partial pressure. The transmittance spectra of the films revealed that they were optically inhomogeneous. A model based on an inhomogeneous layer was applied to extract the refractive index and extinction coefficient from the transmittance and reflectance spectra.",

keywords = "Erbium oxide, Inhomogeneous films, Optical coatings, Optical properties",

author = "Al-Kuhaili, \{M. F.\} and Durrani, \{S. M.A.\}",

note = "Funding Information: The authors acknowledge the support of this work by the Physics Department and the Research Institute of KFUPM. The assistance of Dr. E. E. Khawaja with the numerical calculations is also appreciated.",

year = "2007",

month = jan,

day = "22",

doi = "10.1016/j.tsf.2006.08.048",

language = "English",

volume = "515",

pages = "2885--2890",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "5",

}

TY - JOUR

T1 - Optical properties of erbium oxide thin films deposited by electron beam evaporation

AU - Al-Kuhaili, M. F.

AU - Durrani, S. M.A.

N1 - Funding Information: The authors acknowledge the support of this work by the Physics Department and the Research Institute of KFUPM. The assistance of Dr. E. E. Khawaja with the numerical calculations is also appreciated.

PY - 2007/1/22

Y1 - 2007/1/22

N2 - Erbium oxide thin films were deposited by electron beam evaporation on substrates heated to 300 °C. The effect of the introduction of oxygen on the structural, chemical and optical properties of the films was investigated. The films were characterized using X-ray diffraction, X-ray photoelectron spectroscopy and normal-incidence transmittance and reflectance. The films had microcrystallites embedded in an amorphous matrix, and their stoichiometry was dependent on the oxygen partial pressure. The transmittance spectra of the films revealed that they were optically inhomogeneous. A model based on an inhomogeneous layer was applied to extract the refractive index and extinction coefficient from the transmittance and reflectance spectra.

AB - Erbium oxide thin films were deposited by electron beam evaporation on substrates heated to 300 °C. The effect of the introduction of oxygen on the structural, chemical and optical properties of the films was investigated. The films were characterized using X-ray diffraction, X-ray photoelectron spectroscopy and normal-incidence transmittance and reflectance. The films had microcrystallites embedded in an amorphous matrix, and their stoichiometry was dependent on the oxygen partial pressure. The transmittance spectra of the films revealed that they were optically inhomogeneous. A model based on an inhomogeneous layer was applied to extract the refractive index and extinction coefficient from the transmittance and reflectance spectra.

KW - Erbium oxide

KW - Inhomogeneous films

KW - Optical coatings

KW - Optical properties

UR - https://www.scopus.com/pages/publications/33845944057

U2 - 10.1016/j.tsf.2006.08.048

DO - 10.1016/j.tsf.2006.08.048

M3 - Article

AN - SCOPUS:33845944057

SN - 0040-6090

VL - 515

SP - 2885

EP - 2890

JO - Thin Solid Films

JF - Thin Solid Films

IS - 5

ER -

Optical properties of erbium oxide thin films deposited by electron beam evaporation

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

Fingerprint

Cite this