Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors
- Heekyeong Park
- , Jiyoul Lee
- , Gyuchull Han
- , Abdul Aziz AlMutairi
- , Young Hoon Kim
- , Jaichan Lee
- , Young Min Kim*
- , Young Jun Kim*
- , Youngki Yoon*
- , Sunkook Kim*
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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