Multichannel leak detection system for electrochemical etching

A multichannel leak detection system has been developed to detect any chemical leak during electrochemical etching process. It gives an audible and a visible warnings when there is a leak at any part of the system. This greatly helps in quickly isolating the defective sample which can be removed during operation, while the rest can continue the etching process. The circuit is designed with standard integrated circuits and has its own power supply. Provisions have been made to connect this system to the computer for recording date, time and location of the leaky unetched samples.