Abstract
Cupric oxide (CuO) films were prepared on various substrates by the pulsed laser deposition (PLD) technique to investigate their effects on surface morphology. As the substrate temperature decreased, the film surface roughness was also observed to decrease. This trend was also correlated with the polycrystalline structure of the films. Deposition at low pressures produced greater surface roughness because larger crystallites emerged from the surface, while higher oxygen pressure under an adjusted target-substrate distance produced smaller crystallites and a smoother film surface. Reducing the laser energy density led to lower densities and smaller micro-liquid droplets formed on the surfaces. The presented results could be useful for better understanding the effect of process parameters control on CuO film morphology. It could also serve as a reference for the fabrication of CuO-based devices, in which the surface quality of the CuO films is highly important.
Original language | English |
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Pages (from-to) | 9949-9953 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 258 |
Issue number | 24 |
DOIs | |
State | Published - 1 Oct 2012 |
Externally published | Yes |
Bibliographical note
Funding Information:This work was supported by King Abdulaziz City for Science and Technology . The authors also thank Dr. Jeonggoo Kim from NEOCERA Inc., USA and Prof. Mahmoud Korek from Beirut Arab University, Lebanon for the fruitful discussions.
Keywords
- CuO
- Pulsed laser deposition
- Surface roughness
- Thin film morphology
ASJC Scopus subject areas
- General Chemistry
- Condensed Matter Physics
- General Physics and Astronomy
- Surfaces and Interfaces
- Surfaces, Coatings and Films