Modeling and random search optimization for the polysilicon CVD reactor

  • Bangwen Xi
  • , Gang Xiong
  • , Kirill A. Kozin
  • , Chang He
  • , Tariku Sinshaw Tamir
  • , Yonggang Song
  • , Xiong Liu
  • , Zhen Shen*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Polysilicon is mainly obtained by the Siemens process chemical vapor deposition (CVD) reaction, in which hydrogen gas and trichlorosilane (TCS) are fed into the CVD reactor to produce polysilicon. However, adjusting the feeding parameters in a step-by-step manner according to the actual deposition results is inefficient. In this paper, based on the existing mechanism model of the CVD reactor, we take use of historical data to construct a more accurate simulator. A random search algorithm is used to find good feeding parameters. The simulator can help increase polysilicon productivity while reduce the unit energy consumption.

Original languageEnglish
Article number100320
JournalResults in Control and Optimization
Volume13
DOIs
StatePublished - Dec 2023
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2023 The Author(s)

Keywords

  • CVD reactor
  • Nonlinear regression fitting
  • Random search
  • Simulator

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Modeling and Simulation
  • Control and Optimization
  • Applied Mathematics
  • Artificial Intelligence

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