Microstructural evolution of oxygen incorporated CdTe thin films deposited by close-spaced sublimation

M. N. Harif; K. S. Rahman; C. Doroody; H. N. Rosly; M. Isah; M. A. Alghoul; H. Misran; N. Amin

doi:10.1016/j.matlet.2021.130552

Microstructural evolution of oxygen incorporated CdTe thin films deposited by close-spaced sublimation

M. N. Harif, K. S. Rahman^*, C. Doroody, H. N. Rosly, M. Isah, M. A. Alghoul, H. Misran, N. Amin

^*Corresponding author for this work

Interdisciplinary Research Center for Sustainable Energy Systems

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

In this work, cadmium telluride (CdTe) thin film was deposited in vacuum (pure argon ambient) as well as different argon (Ar) and oxygen (O₂) ambient conditions using close-spaced sublimation (CSS) method at the deposition pressure of 1 Torr. The deposited films were characterized via X-ray Diffraction (XRD), Scanning Electron Microscope (SEM), UV–Vis spectrophotometer and Hall Effect measurement for the analysis of structural properties, morphology, optical properties and electrical properties, respectively. XRD patterns exhibited almost similar preferential orientation plane at (1 1 1) irrespective of the O₂ concentration. SEM surface morphology microstructure revealed that O₂ presence had a substantial effect on grain size reaching up to 7.19 µm. Optical properties also demonstrated insignificant changes in the direct band gap values of around 1.48 eV. Carrier concentration showed an upward trend in the order of 10¹³ cm⁻³, whereby resistivity and mobility did not change substantially either in vacuum (pure Ar ambient) or in Ar/O₂ ambient.

Original language	English
Article number	130552
Journal	Materials Letters
Volume	306
DOIs	https://doi.org/10.1016/j.matlet.2021.130552
State	Published - 1 Jan 2022

Bibliographical note

Publisher Copyright:
© 2021 Elsevier B.V.

Keywords

Ar/O ambient
CdTe thin film
Close-spaced sublimation
Grain size
Microstructure

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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@article{acecaca2c5004715a7f87595f67f46bb,

title = "Microstructural evolution of oxygen incorporated CdTe thin films deposited by close-spaced sublimation",

abstract = "In this work, cadmium telluride (CdTe) thin film was deposited in vacuum (pure argon ambient) as well as different argon (Ar) and oxygen (O2) ambient conditions using close-spaced sublimation (CSS) method at the deposition pressure of 1 Torr. The deposited films were characterized via X-ray Diffraction (XRD), Scanning Electron Microscope (SEM), UV–Vis spectrophotometer and Hall Effect measurement for the analysis of structural properties, morphology, optical properties and electrical properties, respectively. XRD patterns exhibited almost similar preferential orientation plane at (1 1 1) irrespective of the O2 concentration. SEM surface morphology microstructure revealed that O2 presence had a substantial effect on grain size reaching up to 7.19 µm. Optical properties also demonstrated insignificant changes in the direct band gap values of around 1.48 eV. Carrier concentration showed an upward trend in the order of 1013 cm−3, whereby resistivity and mobility did not change substantially either in vacuum (pure Ar ambient) or in Ar/O2 ambient.",

keywords = "Ar/O ambient, CdTe thin film, Close-spaced sublimation, Grain size, Microstructure",

author = "Harif, \{M. N.\} and Rahman, \{K. S.\} and C. Doroody and Rosly, \{H. N.\} and M. Isah and Alghoul, \{M. A.\} and H. Misran and N. Amin",

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year = "2022",

month = jan,

day = "1",

doi = "10.1016/j.matlet.2021.130552",

language = "English",

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T1 - Microstructural evolution of oxygen incorporated CdTe thin films deposited by close-spaced sublimation

AU - Harif, M. N.

AU - Rahman, K. S.

AU - Doroody, C.

AU - Rosly, H. N.

AU - Isah, M.

AU - Alghoul, M. A.

AU - Misran, H.

AU - Amin, N.

PY - 2022/1/1

Y1 - 2022/1/1

N2 - In this work, cadmium telluride (CdTe) thin film was deposited in vacuum (pure argon ambient) as well as different argon (Ar) and oxygen (O2) ambient conditions using close-spaced sublimation (CSS) method at the deposition pressure of 1 Torr. The deposited films were characterized via X-ray Diffraction (XRD), Scanning Electron Microscope (SEM), UV–Vis spectrophotometer and Hall Effect measurement for the analysis of structural properties, morphology, optical properties and electrical properties, respectively. XRD patterns exhibited almost similar preferential orientation plane at (1 1 1) irrespective of the O2 concentration. SEM surface morphology microstructure revealed that O2 presence had a substantial effect on grain size reaching up to 7.19 µm. Optical properties also demonstrated insignificant changes in the direct band gap values of around 1.48 eV. Carrier concentration showed an upward trend in the order of 1013 cm−3, whereby resistivity and mobility did not change substantially either in vacuum (pure Ar ambient) or in Ar/O2 ambient.

AB - In this work, cadmium telluride (CdTe) thin film was deposited in vacuum (pure argon ambient) as well as different argon (Ar) and oxygen (O2) ambient conditions using close-spaced sublimation (CSS) method at the deposition pressure of 1 Torr. The deposited films were characterized via X-ray Diffraction (XRD), Scanning Electron Microscope (SEM), UV–Vis spectrophotometer and Hall Effect measurement for the analysis of structural properties, morphology, optical properties and electrical properties, respectively. XRD patterns exhibited almost similar preferential orientation plane at (1 1 1) irrespective of the O2 concentration. SEM surface morphology microstructure revealed that O2 presence had a substantial effect on grain size reaching up to 7.19 µm. Optical properties also demonstrated insignificant changes in the direct band gap values of around 1.48 eV. Carrier concentration showed an upward trend in the order of 1013 cm−3, whereby resistivity and mobility did not change substantially either in vacuum (pure Ar ambient) or in Ar/O2 ambient.

KW - Ar/O ambient

KW - CdTe thin film

KW - Close-spaced sublimation

KW - Grain size

KW - Microstructure

UR - https://www.scopus.com/pages/publications/85112171257

U2 - 10.1016/j.matlet.2021.130552

DO - 10.1016/j.matlet.2021.130552

M3 - Article

AN - SCOPUS:85112171257

SN - 0167-577X

VL - 306

JO - Materials Letters

JF - Materials Letters

M1 - 130552

ER -

Microstructural evolution of oxygen incorporated CdTe thin films deposited by close-spaced sublimation

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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