Metal/semiconductor phase transition in chromium nitride(001) grown by rf-plasma-assisted molecular-beam epitaxy

Costel Constantin, Muhammad B. Haider, David Ingram, Arthur R. Smith*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

108 Scopus citations

Abstract

Structural and electronic properties of stoichiometric single-phase CrN(001) thin films grown on MgO(001) substrates by radio-frequency N plasma-assisted molecular-beam epitaxy, are investigated. In situ room-temperature scanning tunneling microscopy clearly shows the 1×1 atomic periodicity of the crystal structure as well as long-range topographic distortions which are characteristic of a semiconductor surface. This semiconductor behavior is consistent with ex situ resistivity measurements over the range 285 K and higher, whereas below 260 K, metallic behavior is observed. The resistivity-derived band gap for the high-temperature region, 71 meV, is consistent with the tunneling spectroscopy results. The observed electronic (semiconductor/metal) transition temperature coincides with the temperature of the known coincident magnetic (para-antiferro) and structural (cubic-orthorhombic) phase transitions.

Original languageEnglish
Pages (from-to)6371-6373
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number26
DOIs
StatePublished - 27 Dec 2004
Externally publishedYes

Bibliographical note

Funding Information:
This work was supported by the National Science Foundation under Grant Nos. 9983816 and 0304314. The authors acknowledge useful discussions with H. Al-Brithen, and H. H. Richardson.

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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