La-Si-O-N glasses. Part I. Extension of the glass forming region

The nitrogen-rich part of the glass forming region in the La-Si-O-N system has been the subject of a comprehensive study. Glasses were prepared by heating powder mixtures of La metal, Si₃N₄ and SiO₂ in a nitrogen atmosphere at 1650-1800 °C. By this new synthesis route, glasses containing up to 68 e/o of N and 62 e/o of La were prepared, showing that the glass forming region is significantly larger than previously reported. The glasses were characterized by elemental analysis, differential thermal analysis, X-ray powder diffraction, and scanning electron microscopy. They were found to be X-ray amorphous and homogenous, with the majority of them containing small amounts of crystalline La silicides and elemental Si. Glass transition temperatures (T_g) were found to vary between 900 and 1100 °C and crystallization to occur typically 120 °C above T_g. The forming of the glasses was investigated by characterizing samples taken out at various steps of the heating cycle. The results indicate that the glass formation is strongly dependent on reaction kinetics. A strong exothermal reaction occurs at temperatures 900-1100 °C, leading to the formation of assemblies of amorphous and crystalline (oxy)nitride phases that melt upon further heating at 1650-1800 °C.