IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing

  • J. Pola*
  • , M. Urbanová
  • , D. Pokorná
  • , S. Bakardjieva
  • , J. Ubrt
  • , Z. Bastl
  • , M. A. Gondal
  • , H. M. Masoudi
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

IR laser-induced gas-phase photolysis of Fe(CO) 5-SiH 4 mixtures occurs as SiH 4-photosensitized decomposition of Fe(CO) 5 is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid films were made by FTIR, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy. The deposited films are amorphous, contain crystalline nanostructures of iron silicide FeSi 2 and undergo atmospheric oxidation in topmost layers to iron oxide and hydrogenated silicon oxide. Upon annealing they develop nanocrystalline structures of ferrisilicate, Fe 1.6SiO 4, carbon-encaged iron disilicide, FeSi 2, and very rare hexagonal (high-pressure) Fe surviving at ambient conditions. The mechanism of formation of these nanostructures is discussed in terms of gas-phase and solid-phase reactions.

Original languageEnglish
Pages (from-to)1727-1733
Number of pages7
JournalDalton Transactions
Volume41
Issue number6
DOIs
StatePublished - 14 Feb 2012

ASJC Scopus subject areas

  • Inorganic Chemistry

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