IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing

J. Pola; M. Urbanová; D. Pokorná; S. Bakardjieva; J. Ubrt; Z. Bastl; M. A. Gondal; H. M. Masoudi

doi:10.1039/c1dt11587a

IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing

J. Pola^*, M. Urbanová, D. Pokorná, S. Bakardjieva, J. Ubrt, Z. Bastl, M. A. Gondal, H. M. Masoudi

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

IR laser-induced gas-phase photolysis of Fe(CO) ₅-SiH ₄ mixtures occurs as SiH ₄-photosensitized decomposition of Fe(CO) ₅ is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid films were made by FTIR, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy. The deposited films are amorphous, contain crystalline nanostructures of iron silicide FeSi ₂ and undergo atmospheric oxidation in topmost layers to iron oxide and hydrogenated silicon oxide. Upon annealing they develop nanocrystalline structures of ferrisilicate, Fe _1.6SiO ₄, carbon-encaged iron disilicide, FeSi ₂, and very rare hexagonal (high-pressure) Fe surviving at ambient conditions. The mechanism of formation of these nanostructures is discussed in terms of gas-phase and solid-phase reactions.

Original language	English
Pages (from-to)	1727-1733
Number of pages	7
Journal	Dalton Transactions
Volume	41
Issue number	6
DOIs	https://doi.org/10.1039/c1dt11587a
State	Published - 14 Feb 2012

ASJC Scopus subject areas

Inorganic Chemistry

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title = "IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing",

abstract = "IR laser-induced gas-phase photolysis of Fe(CO) 5-SiH 4 mixtures occurs as SiH 4-photosensitized decomposition of Fe(CO) 5 is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid films were made by FTIR, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy. The deposited films are amorphous, contain crystalline nanostructures of iron silicide FeSi 2 and undergo atmospheric oxidation in topmost layers to iron oxide and hydrogenated silicon oxide. Upon annealing they develop nanocrystalline structures of ferrisilicate, Fe 1.6SiO 4, carbon-encaged iron disilicide, FeSi 2, and very rare hexagonal (high-pressure) Fe surviving at ambient conditions. The mechanism of formation of these nanostructures is discussed in terms of gas-phase and solid-phase reactions.",

author = "J. Pola and M. Urbanov{\'a} and D. Pokorn{\'a} and S. Bakardjieva and J. Ubrt and Z. Bastl and Gondal, {M. A.} and Masoudi, {H. M.}",

year = "2012",

month = feb,

day = "14",

doi = "10.1039/c1dt11587a",

language = "English",

volume = "41",

pages = "1727--1733",

journal = "Dalton Transactions",

issn = "1477-9226",

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TY - JOUR

T1 - IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing

AU - Pola, J.

AU - Urbanová, M.

AU - Pokorná, D.

AU - Bakardjieva, S.

AU - Ubrt, J.

AU - Bastl, Z.

AU - Gondal, M. A.

AU - Masoudi, H. M.

PY - 2012/2/14

Y1 - 2012/2/14

N2 - IR laser-induced gas-phase photolysis of Fe(CO) 5-SiH 4 mixtures occurs as SiH 4-photosensitized decomposition of Fe(CO) 5 is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid films were made by FTIR, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy. The deposited films are amorphous, contain crystalline nanostructures of iron silicide FeSi 2 and undergo atmospheric oxidation in topmost layers to iron oxide and hydrogenated silicon oxide. Upon annealing they develop nanocrystalline structures of ferrisilicate, Fe 1.6SiO 4, carbon-encaged iron disilicide, FeSi 2, and very rare hexagonal (high-pressure) Fe surviving at ambient conditions. The mechanism of formation of these nanostructures is discussed in terms of gas-phase and solid-phase reactions.

AB - IR laser-induced gas-phase photolysis of Fe(CO) 5-SiH 4 mixtures occurs as SiH 4-photosensitized decomposition of Fe(CO) 5 is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid films were made by FTIR, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy. The deposited films are amorphous, contain crystalline nanostructures of iron silicide FeSi 2 and undergo atmospheric oxidation in topmost layers to iron oxide and hydrogenated silicon oxide. Upon annealing they develop nanocrystalline structures of ferrisilicate, Fe 1.6SiO 4, carbon-encaged iron disilicide, FeSi 2, and very rare hexagonal (high-pressure) Fe surviving at ambient conditions. The mechanism of formation of these nanostructures is discussed in terms of gas-phase and solid-phase reactions.

UR - http://www.scopus.com/inward/record.url?scp=84856752398&partnerID=8YFLogxK

U2 - 10.1039/c1dt11587a

DO - 10.1039/c1dt11587a

M3 - Article

C2 - 22159449

AN - SCOPUS:84856752398

SN - 1477-9226

VL - 41

SP - 1727

EP - 1733

JO - Dalton Transactions

JF - Dalton Transactions

IS - 6

ER -

IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing

Abstract

ASJC Scopus subject areas

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