Investigating the structural and optoelectronic properties of co-sputtered Fe-doped WO3 thin films and their suitability for photocatalytic applications

M. F. Al-Kuhaili*, Q. A. Drmosh

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Tungsten oxide (WO3) thin films are widely used as functional coatings in electrochromic smart windows, gas sensing, and photocatalysis. Tailoring their properties is needed for their optimum use as coatings to meet the intended applications, with extrinsic doping as one of the best ways to achieve this objective. Fe has emerged as one of the most effective doping agents in WO3 owing to the similar ionic radii of W and Fe. Previous results highlighted an improvement in the structural, optoelectronic, and functional properties of Fe-doped WO3. In this work, Fe-doped WO3 thin films were deposited by co–sputtering. Contrary to previous reports, the films showed reduced crystallinity, enhanced electrical resistivity, and widened band gap, leading to inferior performance of functional coatings, as demonstrated by their lower photocatalytic water oxidation efficiency.

Original languageEnglish
Article number125897
JournalMaterials Chemistry and Physics
Volume281
DOIs
StatePublished - 1 Apr 2022

Bibliographical note

Publisher Copyright:
© 2022 Elsevier B.V.

Keywords

  • Band gap
  • Doping
  • Electrical conductivity
  • Iron
  • Sputtering
  • Tungsten oxide

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics

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