Influence of germanium incorporation on the structural and electrical properties of boron-doped ultrathin poly-Si1-x Ge x films deposited by chemical vapour deposition
- T. B. Asafa*
- , A. Witvrouw
- , B. S. Morcos
- , K. Vanstreels
- , S. A.M. Said
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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