High coercivity Co-ferrite thin films on SiO2 (1 0 0) substrate

Y. C. Wang; J. Ding; J. B. Yi; B. H. Liu; T. Yu; Z. X. Shen

doi:10.1016/j.jmmm.2004.04.048

High coercivity Co-ferrite thin films on SiO₂ (1 0 0) substrate

Y. C. Wang
, J. Ding^*
, J. B. Yi
, B. H. Liu
, T. Yu
, Z. X. Shen

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

13 Scopus citations

Abstract

Co-ferrite thin films were prepared by sputtering and subsequent annealing. Magnetic properties were strongly dependent on annealing temperature, annealing duration and film thickness. A coercivity as high as 9.3kOe was achieved in the Co-ferrite film with a thickness of 50nm. A small film thickness can restrict the formation of large particles. The high coercivity was associated with a nano-structure and lattice strain.

Original language	English
Pages (from-to)	211-215
Number of pages	5
Journal	Journal of Magnetism and Magnetic Materials
Volume	282
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jmmm.2004.04.048
State	Published - Nov 2004
Externally published	Yes
Event	International Symposium on Advanced Magnetic Technologies - Taipei, Taiwan, Province of China Duration: 13 Nov 2003 → 16 Nov 2003

Keywords

CO-ferrite
High coercivity
Thin film

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

Access to Document

10.1016/j.jmmm.2004.04.048

Cite this

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title = "High coercivity Co-ferrite thin films on SiO2 (1 0 0) substrate",

abstract = "Co-ferrite thin films were prepared by sputtering and subsequent annealing. Magnetic properties were strongly dependent on annealing temperature, annealing duration and film thickness. A coercivity as high as 9.3kOe was achieved in the Co-ferrite film with a thickness of 50nm. A small film thickness can restrict the formation of large particles. The high coercivity was associated with a nano-structure and lattice strain.",

keywords = "CO-ferrite, High coercivity, Thin film",

author = "Wang, \{Y. C.\} and J. Ding and Yi, \{J. B.\} and Liu, \{B. H.\} and T. Yu and Shen, \{Z. X.\}",

year = "2004",

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doi = "10.1016/j.jmmm.2004.04.048",

language = "English",

volume = "282",

pages = "211--215",

journal = "Journal of Magnetism and Magnetic Materials",

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number = "1-3",

note = "International Symposium on Advanced Magnetic Technologies ; Conference date: 13-11-2003 Through 16-11-2003",

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TY - JOUR

T1 - High coercivity Co-ferrite thin films on SiO2 (1 0 0) substrate

AU - Wang, Y. C.

AU - Ding, J.

AU - Yi, J. B.

AU - Liu, B. H.

AU - Yu, T.

AU - Shen, Z. X.

PY - 2004/11

Y1 - 2004/11

N2 - Co-ferrite thin films were prepared by sputtering and subsequent annealing. Magnetic properties were strongly dependent on annealing temperature, annealing duration and film thickness. A coercivity as high as 9.3kOe was achieved in the Co-ferrite film with a thickness of 50nm. A small film thickness can restrict the formation of large particles. The high coercivity was associated with a nano-structure and lattice strain.

AB - Co-ferrite thin films were prepared by sputtering and subsequent annealing. Magnetic properties were strongly dependent on annealing temperature, annealing duration and film thickness. A coercivity as high as 9.3kOe was achieved in the Co-ferrite film with a thickness of 50nm. A small film thickness can restrict the formation of large particles. The high coercivity was associated with a nano-structure and lattice strain.

KW - CO-ferrite

KW - High coercivity

KW - Thin film

UR - https://www.scopus.com/pages/publications/6344226097

U2 - 10.1016/j.jmmm.2004.04.048

DO - 10.1016/j.jmmm.2004.04.048

M3 - Conference article

AN - SCOPUS:6344226097

SN - 0304-8853

VL - 282

SP - 211

EP - 215

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - 1-3

T2 - International Symposium on Advanced Magnetic Technologies

Y2 - 13 November 2003 through 16 November 2003

ER -