Electrochemical AFM "dip-pen" nanolithography and more

Yan Li; Ben Maynor; Jie Liu

Electrochemical AFM "dip-pen" nanolithography and more

Yan Li^*
, Ben Maynor
, Jie Liu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

A general approach for fabricating metallic and semiconducting nanostructures has been developed based on "dip-pen" nanolithography combined with electrochemical reduction of water-soluble salts. This method can be used to directly write many different types of metal or semiconductor features on Si substrates with sub 50 nanometer linewidth. This simple but powerful method has great potential in fabricating functional nanodevices with high degree of control over their locations and structures.

Original language	English
Pages (from-to)	75-78
Number of pages	4
Journal	Chinese Journal of Inorganic Chemistry
Volume	18
Issue number	1
State	Published - 2002

Keywords

AFM
Dip-pen lithography
Electrochemical
Nanopatterns

ASJC Scopus subject areas

Inorganic Chemistry

Cite this

@article{c9d50daa8417412c9be803ffa3eea019,

title = "Electrochemical AFM {"}dip-pen{"} nanolithography and more",

abstract = "A general approach for fabricating metallic and semiconducting nanostructures has been developed based on {"}dip-pen{"} nanolithography combined with electrochemical reduction of water-soluble salts. This method can be used to directly write many different types of metal or semiconductor features on Si substrates with sub 50 nanometer linewidth. This simple but powerful method has great potential in fabricating functional nanodevices with high degree of control over their locations and structures.",

keywords = "AFM, Dip-pen lithography, Electrochemical, Nanopatterns",

author = "Yan Li and Ben Maynor and Jie Liu",

year = "2002",

language = "English",

volume = "18",

pages = "75--78",

journal = "Chinese Journal of Inorganic Chemistry",

issn = "1001-4861",

publisher = "Chinese Chemical Society",

number = "1",

}

TY - JOUR

T1 - Electrochemical AFM "dip-pen" nanolithography and more

AU - Li, Yan

AU - Maynor, Ben

AU - Liu, Jie

PY - 2002

Y1 - 2002

N2 - A general approach for fabricating metallic and semiconducting nanostructures has been developed based on "dip-pen" nanolithography combined with electrochemical reduction of water-soluble salts. This method can be used to directly write many different types of metal or semiconductor features on Si substrates with sub 50 nanometer linewidth. This simple but powerful method has great potential in fabricating functional nanodevices with high degree of control over their locations and structures.

AB - A general approach for fabricating metallic and semiconducting nanostructures has been developed based on "dip-pen" nanolithography combined with electrochemical reduction of water-soluble salts. This method can be used to directly write many different types of metal or semiconductor features on Si substrates with sub 50 nanometer linewidth. This simple but powerful method has great potential in fabricating functional nanodevices with high degree of control over their locations and structures.

KW - AFM

KW - Dip-pen lithography

KW - Electrochemical

KW - Nanopatterns

UR - https://www.scopus.com/pages/publications/11244309261

M3 - Article

AN - SCOPUS:11244309261

SN - 1001-4861

VL - 18

SP - 75

EP - 78

JO - Chinese Journal of Inorganic Chemistry

JF - Chinese Journal of Inorganic Chemistry

IS - 1

ER -

Electrochemical AFM "dip-pen" nanolithography and more

Abstract

Keywords

ASJC Scopus subject areas

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