Effect of yttrium doping on the dielectric properties of CaCu3Ti4O12 thin film produced by chemical solution deposition

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17 Scopus citations

Abstract

Pure and yttrium substituted CaCu3Ti4 - xYxO12 - x / 2 (x = 0, 0.02, 0.1) thin films were prepared on boron doped silica substrate employing chemical solution deposition, spin coating and rapid thermal annealing. The phase and microstructure of the sintered films were examined using X-ray diffraction and scanning electron microscopy. Dielectric properties of the films were measured at room temperature using electrochemical impedance spectroscopy. Highly ordered polycrystalline CCTO thin film with bimodal grain size distribution was achieved at a sintering temperature of 800 °C. Yttrium doping was found to have beneficial effects on the dielectric properties of CCTO thin film. Dielectric parameters obtained for a CaCu3Ti4 - xYxO12 - x / 2 (x = 0.02) film at 1 KHz were k ∼ 2700 and tan δ ∼ 0.07.

Original languageEnglish
Pages (from-to)3896-3899
Number of pages4
JournalThin Solid Films
Volume517
Issue number14
DOIs
StatePublished - 29 May 2009
Externally publishedYes

Keywords

  • CaCuTiO
  • Chemical solution deposition
  • Dielectric properties
  • Thin film
  • Yttrium doping

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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