Effect of Si incorporation on the properties of niobium nitride films deposited by DC reactive magnetron sputtering
- Moushab Benkahoul*
- , C. S. Sandu
- , N. Tabet
- , M. Parlinska-Wojtan
- , A. Karimi
- , F. Lévy
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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