Abstract
Chromium-doped titanium nitride thin films are deposited using RF/DC reactive magnetron co-sputtering technique. Optical, chemical, surface morphology and magnetic properties of the deposited films are studied using spectrophotometry, X-ray photoelectron spectroscopy, atomic force microscopy, and vibrating sample magnetometry, respectively. Films are prepared with different concentration of chromium by adjusting the sputtering power of magnetron using chromium target. A redshift in the bandgap of Cr-TiN films is observed as a function of chromium concentration. X-ray photoelectron spectroscopy confirms the presence of chromium in the films in third (Cr+3) and sixth (Cr+6) oxidation state. The films with lower concentration of chromium exhibit ferromagnetism with clear hysteresis loop at 3 K and at room temperature with higher saturation magnetization compared to the films grown with higher Cr concentration.
| Original language | English |
|---|---|
| Article number | 2200544 |
| Journal | Physica Status Solidi (A) Applications and Materials Science |
| Volume | 220 |
| Issue number | 5 |
| DOIs | |
| State | Published - Mar 2023 |
Bibliographical note
Publisher Copyright:© 2023 Wiley-VCH GmbH.
Keywords
- RF/DC magnetron sputtering
- X-ray photoelectron spectroscopy
- atomic force microscopy
- dilute magnetic semiconductors
- thin films
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
- Electrical and Electronic Engineering
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