Effect of Cr Concentration on the Optical and Magnetic Properties of Cr-TiN Thin Films Grown by Reactive Magnetron Sputtering

Ebrahim Abualgassem, Monzer Maarouf, Abdulhakim Bake, David Cortie, Khan Alam, Muhammad Baseer Haider*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Chromium-doped titanium nitride thin films are deposited using RF/DC reactive magnetron co-sputtering technique. Optical, chemical, surface morphology and magnetic properties of the deposited films are studied using spectrophotometry, X-ray photoelectron spectroscopy, atomic force microscopy, and vibrating sample magnetometry, respectively. Films are prepared with different concentration of chromium by adjusting the sputtering power of magnetron using chromium target. A redshift in the bandgap of Cr-TiN films is observed as a function of chromium concentration. X-ray photoelectron spectroscopy confirms the presence of chromium in the films in third (Cr+3) and sixth (Cr+6) oxidation state. The films with lower concentration of chromium exhibit ferromagnetism with clear hysteresis loop at 3 K and at room temperature with higher saturation magnetization compared to the films grown with higher Cr concentration.

Original languageEnglish
Article number2200544
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume220
Issue number5
DOIs
StatePublished - Mar 2023

Bibliographical note

Publisher Copyright:
© 2023 Wiley-VCH GmbH.

Keywords

  • RF/DC magnetron sputtering
  • X-ray photoelectron spectroscopy
  • atomic force microscopy
  • dilute magnetic semiconductors
  • thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry
  • Electrical and Electronic Engineering

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