Direct top-down ordering of diblock copolymers through nanoimprint lithography

M. Salaün; N. Kehagias; B. Salhi; T. Baron; J. Boussey; C. M. Sotomayor Torres; M. Zelsmann

doi:10.1116/1.3662399

Direct top-down ordering of diblock copolymers through nanoimprint lithography

M. Salaün^*, N. Kehagias, B. Salhi, T. Baron, J. Boussey, C. M. Sotomayor Torres, M. Zelsmann

^*Corresponding author for this work

Research output: Contribution to journal › Review article › peer-review

9 Scopus citations

Abstract

In this work, thermal nanoimprint lithography (NIL) is used on full 8 in. silicon wafers to imprint a thin PS-b-PMMA block copolymer (BCP) layer. The authors show that the imprinted BCP layer can thermally self-organize after the NIL process or during the NIL process itself, depending on experimental conditions used. Self-organized imprinted features with good graphoepitaxy alignment are obtained with a cylindrical BCP. Nevertheless, a standard fluorinated silane mold treatment is shown not to be neutral to the BCP. Then, if the line features do not have a thickness exactly commensurable to the natural self-organizing period of the polymer l₀, a surface wetting layer is observed.

Original language	English
Article number	06F208
Journal	Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume	29
Issue number	6
DOIs	https://doi.org/10.1116/1.3662399
State	Published - Nov 2011
Externally published	Yes

Bibliographical note

Funding Information:
This work is supported by the EU project LAMAND (Contract No. 245565). The contents of this work are the sole responsibility of the authors.

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Process Chemistry and Technology
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

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Cite this

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title = "Direct top-down ordering of diblock copolymers through nanoimprint lithography",

abstract = "In this work, thermal nanoimprint lithography (NIL) is used on full 8 in. silicon wafers to imprint a thin PS-b-PMMA block copolymer (BCP) layer. The authors show that the imprinted BCP layer can thermally self-organize after the NIL process or during the NIL process itself, depending on experimental conditions used. Self-organized imprinted features with good graphoepitaxy alignment are obtained with a cylindrical BCP. Nevertheless, a standard fluorinated silane mold treatment is shown not to be neutral to the BCP. Then, if the line features do not have a thickness exactly commensurable to the natural self-organizing period of the polymer l0, a surface wetting layer is observed.",

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AU - Salaün, M.

AU - Kehagias, N.

AU - Salhi, B.

AU - Baron, T.

AU - Boussey, J.

AU - Sotomayor Torres, C. M.

AU - Zelsmann, M.

N1 - Funding Information: This work is supported by the EU project LAMAND (Contract No. 245565). The contents of this work are the sole responsibility of the authors.

PY - 2011/11

Y1 - 2011/11

N2 - In this work, thermal nanoimprint lithography (NIL) is used on full 8 in. silicon wafers to imprint a thin PS-b-PMMA block copolymer (BCP) layer. The authors show that the imprinted BCP layer can thermally self-organize after the NIL process or during the NIL process itself, depending on experimental conditions used. Self-organized imprinted features with good graphoepitaxy alignment are obtained with a cylindrical BCP. Nevertheless, a standard fluorinated silane mold treatment is shown not to be neutral to the BCP. Then, if the line features do not have a thickness exactly commensurable to the natural self-organizing period of the polymer l0, a surface wetting layer is observed.

AB - In this work, thermal nanoimprint lithography (NIL) is used on full 8 in. silicon wafers to imprint a thin PS-b-PMMA block copolymer (BCP) layer. The authors show that the imprinted BCP layer can thermally self-organize after the NIL process or during the NIL process itself, depending on experimental conditions used. Self-organized imprinted features with good graphoepitaxy alignment are obtained with a cylindrical BCP. Nevertheless, a standard fluorinated silane mold treatment is shown not to be neutral to the BCP. Then, if the line features do not have a thickness exactly commensurable to the natural self-organizing period of the polymer l0, a surface wetting layer is observed.

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Direct top-down ordering of diblock copolymers through nanoimprint lithography

Abstract

Bibliographical note

ASJC Scopus subject areas

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