Abstract
A Luus-Jaakola optimization procedure is described that simultaneously determines the optical constants, thickness and root mean square roughness of thin films for reflectance versus angle-of-incidences data measured in the EUV/soft X-ray region. The optimization method is applied to different films at different wavelengths. The results show that the Luus-Jaakola optimization procedure is able to determine the thickness of films and the roughness with an accuracy of less than 7%. The optical constants obtained are also in good agreement with reported values for films having an error of less than 1%.
| Original language | English |
|---|---|
| Pages (from-to) | 110-113 |
| Number of pages | 4 |
| Journal | Optics Communications |
| Volume | 280 |
| Issue number | 1 |
| DOIs | |
| State | Published - 1 Dec 2007 |
| Externally published | Yes |
Bibliographical note
Funding Information:The authors would like to acknowledge the financial support from the Government of Saudi Arabia for this study.
Keywords
- Index of refraction
- Luus-Jaakola optimization
- Optical constants
- Reflectivity
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Physical and Theoretical Chemistry
- Electrical and Electronic Engineering