Density of vapor deposited amorphous Ge films

E. E. Khawaja*, S. M.A. Durrani, A. B. Hallak, M. Sakhawat Hussain

*Corresponding author for this work

Research output: Contribution to journalLetterpeer-review

6 Scopus citations

Abstract

The density of vapor-deposited amorphous Ge films (a-Ge) was determined by spectrophotometry combined with Rutherford backscattering spectroscopy. It was found to be 0.99±3% of the bulk value for crystalline Ge (c-Ge). This density is in agreement with the Lorentz-Lorenz law which, based upon the existing infrared data on the index of refraction of a-Ge, suggests that the density of a-Ge should be close (within 4%) to that of c-Ge.

Original languageEnglish
Pages (from-to)308-311
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume170
Issue number3
DOIs
StatePublished - 1 Jul 1994

Bibliographical note

Funding Information:
This work is part of KFUPM/RI project LRL supported by the King Fahd University of Petroleum and Minerals.

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

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