Contact resistance behavior of nanocrystalline copper and palladium films under fretting conditions

  • M. Braunovic*
  • , M. Trudeau
  • , K. Bryden
  • , J. Y. Ying
  • *Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

The effect of fretting on the contact resistance behavior of nanocrystalline Cu and Pd films deposited on Cu, Ni, and Al plates in contact with Cu, Al and Sn-plated copper wire conductors was investigated. The tests were conducted with a simulated connector configuration using a differential thermal expansion fixture to produce a fretting motion of 30 μm at a frequency of 0.005 Hz. In addition to the contact resistance measurements, scanning electron microscopy (SEM) and X-ray fluorescence (EDX) analyses were used to study the processes involved. The results show that in practically all cases, the nanocrystalline Cu and Pd films had a beneficial effect on the contact resistance behavior as manifested by relatively small fluctuations of the contact resistance with fretting time. However, when the films were worn out by the fretting action, a rapid increase in the contact resistance was observed. SEM and EDX analyses of the worn contact zones revealed that these were damaged by fretting action and in some cases transfer of material was observed. However, this damage was considerably less pronounced than that observed when the base metals were subjected to the same fretting conditions. It is believed that the beneficial effect of nanocrystalline films is due to the improved mechanical properties of these films.

Original languageEnglish
Pages (from-to)71-82
Number of pages12
JournalElectrical Contacts, Proceedings of the Annual Holm Conference on Electrical Contacts
StatePublished - 1995
Externally publishedYes
EventProceedings of the 41st IEEE Holm Conference on Electrical Contacts - Montreal, Can
Duration: 2 Oct 19954 Oct 1995

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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