CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns
- G. Gay*
- , T. Baron
- , C. Agraffeil
- , B. Salhi
- , T. Chevolleau
- , G. Cunge
- , H. Grampeix
- , J. H. Tortai
- , F. Martin
- , E. Jalaguier
- , B. De Salvo
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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