Chemical and optical properties of thermally evaporated manganese oxide thin films

M. F. Al-Kuhaili

doi:10.1116/1.2217982

Chemical and optical properties of thermally evaporated manganese oxide thin films

M. F. Al-Kuhaili^*

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

Manganese oxide thin films were deposited using thermal evaporation from a tungsten boat. Films were deposited under an oxygen atmosphere, and the effects of thickness, substrate temperature, and deposition rate on their properties were investigated. The chemical properties of the films were studied using x-ray photoelectron spectroscopy and x-ray fluorescence. The optical properties were determined from normal-incidence transmittance and reflectance. Based on the chemical and optical characterizations, the optimum conditions for the deposition of the films were investigated. Subsequently, the optical properties (refractive index, extinction coefficient, and band gap) of these films were determined.

Original language	English
Pages (from-to)	1746-1750
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	24
Issue number	5
DOIs	https://doi.org/10.1116/1.2217982
State	Published - 2006

Bibliographical note

Funding Information:
The support to this work by the Physics Department and the Research Institute of KFUPM is acknowledged. Moreover, the assistance of Dr. E. E. Khawaja with numerical computations is acknowledged. FIG. 1. Typical wide-scan x-ray photoelectron spectrum of a manganese oxide thin film. FIG. 2. Typical XPS Mn 2 p 3 ∕ 2 core level spectrum. The spectrum was deconvoluted into four components, corresponding to the four oxidation states of manganese oxide: (a) Mn O 2 , (b) Mn 3 O 4 , (c) Mn 2 O 3 , and (d) MnO. FIG. 3. (a) Mean oxidation state of manganese oxide thin films, as determined from XPS. RO refers to films deposited on unheated substrates, and HO refers to films deposited on heated substrates ( 300 ° C ) . The numbers in parentheses refer to the deposition rates in nm/s. (b) The tungsten/manganese ratio of the films, as determined from XRF. The accuracy of the oxidation state is ± 0.2 and that of the W ∕ Mn ratio is ± 0.05 . FIG. 4. (a) Transmittance spectra of thin manganese oxide films ( d qc = 100 nm ) . (b) Reflectance spectra of the thin manganese oxide films. The transmittance and reflectance spectra for the thin films deposited at 0.1 or 0.2 nm ∕ s were identical. (c) Transmittance spectra of thick manganese oxide films ( d qc = 300 nm ) . (d) Reflectance spectra of the thick manganese oxide films. The spectra in (c) and (d) correspond to films deposited at 0.1 nm ∕ s . Similar spectra were obtained for films deposited at 0.2 nm ∕ s . R s is the reflectance of the fused silica substrate. FIG. 5. Refractive index as a function of wavelength of a sample deposited on a heated substrate (HO). The continuous curve represents the acceptable dispersion curve. FIG. 6. (a) Dispersion of the refractive index of manganese oxide thin films whose spectra are shown in Fig. 4(a) . (b) Dispersion of the extinction coefficient of the same films. FIG. 7. Variation of (a) ( α h ν ) 2 and (b) ( α h ν ) 1 ∕ 2 with photon energy for manganese oxide thin films.

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1116/1.2217982

Cite this

@article{0daa5ccfdf9c4d2fbe2586129d19dcec,

title = "Chemical and optical properties of thermally evaporated manganese oxide thin films",

abstract = "Manganese oxide thin films were deposited using thermal evaporation from a tungsten boat. Films were deposited under an oxygen atmosphere, and the effects of thickness, substrate temperature, and deposition rate on their properties were investigated. The chemical properties of the films were studied using x-ray photoelectron spectroscopy and x-ray fluorescence. The optical properties were determined from normal-incidence transmittance and reflectance. Based on the chemical and optical characterizations, the optimum conditions for the deposition of the films were investigated. Subsequently, the optical properties (refractive index, extinction coefficient, and band gap) of these films were determined.",

author = "Al-Kuhaili, \{M. F.\}",

note = "Funding Information: The support to this work by the Physics Department and the Research Institute of KFUPM is acknowledged. Moreover, the assistance of Dr. E. E. Khawaja with numerical computations is acknowledged. FIG. 1. Typical wide-scan x-ray photoelectron spectrum of a manganese oxide thin film. FIG. 2. Typical XPS Mn 2 p 3 ∕ 2 core level spectrum. The spectrum was deconvoluted into four components, corresponding to the four oxidation states of manganese oxide: (a) Mn O 2 , (b) Mn 3 O 4 , (c) Mn 2 O 3 , and (d) MnO. FIG. 3. (a) Mean oxidation state of manganese oxide thin films, as determined from XPS. RO refers to films deposited on unheated substrates, and HO refers to films deposited on heated substrates ( 300 ° C ) . The numbers in parentheses refer to the deposition rates in nm/s. (b) The tungsten/manganese ratio of the films, as determined from XRF. The accuracy of the oxidation state is ± 0.2 and that of the W ∕ Mn ratio is ± 0.05 . FIG. 4. (a) Transmittance spectra of thin manganese oxide films ( d qc = 100 nm ) . (b) Reflectance spectra of the thin manganese oxide films. The transmittance and reflectance spectra for the thin films deposited at 0.1 or 0.2 nm ∕ s were identical. (c) Transmittance spectra of thick manganese oxide films ( d qc = 300 nm ) . (d) Reflectance spectra of the thick manganese oxide films. The spectra in (c) and (d) correspond to films deposited at 0.1 nm ∕ s . Similar spectra were obtained for films deposited at 0.2 nm ∕ s . R s is the reflectance of the fused silica substrate. FIG. 5. Refractive index as a function of wavelength of a sample deposited on a heated substrate (HO). The continuous curve represents the acceptable dispersion curve. FIG. 6. (a) Dispersion of the refractive index of manganese oxide thin films whose spectra are shown in Fig. 4(a) . (b) Dispersion of the extinction coefficient of the same films. FIG. 7. Variation of (a) ( α h ν ) 2 and (b) ( α h ν ) 1 ∕ 2 with photon energy for manganese oxide thin films. ",

year = "2006",

doi = "10.1116/1.2217982",

language = "English",

volume = "24",

pages = "1746--1750",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "5",

}

TY - JOUR

T1 - Chemical and optical properties of thermally evaporated manganese oxide thin films

AU - Al-Kuhaili, M. F.

N1 - Funding Information: The support to this work by the Physics Department and the Research Institute of KFUPM is acknowledged. Moreover, the assistance of Dr. E. E. Khawaja with numerical computations is acknowledged. FIG. 1. Typical wide-scan x-ray photoelectron spectrum of a manganese oxide thin film. FIG. 2. Typical XPS Mn 2 p 3 ∕ 2 core level spectrum. The spectrum was deconvoluted into four components, corresponding to the four oxidation states of manganese oxide: (a) Mn O 2 , (b) Mn 3 O 4 , (c) Mn 2 O 3 , and (d) MnO. FIG. 3. (a) Mean oxidation state of manganese oxide thin films, as determined from XPS. RO refers to films deposited on unheated substrates, and HO refers to films deposited on heated substrates ( 300 ° C ) . The numbers in parentheses refer to the deposition rates in nm/s. (b) The tungsten/manganese ratio of the films, as determined from XRF. The accuracy of the oxidation state is ± 0.2 and that of the W ∕ Mn ratio is ± 0.05 . FIG. 4. (a) Transmittance spectra of thin manganese oxide films ( d qc = 100 nm ) . (b) Reflectance spectra of the thin manganese oxide films. The transmittance and reflectance spectra for the thin films deposited at 0.1 or 0.2 nm ∕ s were identical. (c) Transmittance spectra of thick manganese oxide films ( d qc = 300 nm ) . (d) Reflectance spectra of the thick manganese oxide films. The spectra in (c) and (d) correspond to films deposited at 0.1 nm ∕ s . Similar spectra were obtained for films deposited at 0.2 nm ∕ s . R s is the reflectance of the fused silica substrate. FIG. 5. Refractive index as a function of wavelength of a sample deposited on a heated substrate (HO). The continuous curve represents the acceptable dispersion curve. FIG. 6. (a) Dispersion of the refractive index of manganese oxide thin films whose spectra are shown in Fig. 4(a) . (b) Dispersion of the extinction coefficient of the same films. FIG. 7. Variation of (a) ( α h ν ) 2 and (b) ( α h ν ) 1 ∕ 2 with photon energy for manganese oxide thin films.

PY - 2006

Y1 - 2006

N2 - Manganese oxide thin films were deposited using thermal evaporation from a tungsten boat. Films were deposited under an oxygen atmosphere, and the effects of thickness, substrate temperature, and deposition rate on their properties were investigated. The chemical properties of the films were studied using x-ray photoelectron spectroscopy and x-ray fluorescence. The optical properties were determined from normal-incidence transmittance and reflectance. Based on the chemical and optical characterizations, the optimum conditions for the deposition of the films were investigated. Subsequently, the optical properties (refractive index, extinction coefficient, and band gap) of these films were determined.

AB - Manganese oxide thin films were deposited using thermal evaporation from a tungsten boat. Films were deposited under an oxygen atmosphere, and the effects of thickness, substrate temperature, and deposition rate on their properties were investigated. The chemical properties of the films were studied using x-ray photoelectron spectroscopy and x-ray fluorescence. The optical properties were determined from normal-incidence transmittance and reflectance. Based on the chemical and optical characterizations, the optimum conditions for the deposition of the films were investigated. Subsequently, the optical properties (refractive index, extinction coefficient, and band gap) of these films were determined.

UR - https://www.scopus.com/pages/publications/33748577737

U2 - 10.1116/1.2217982

DO - 10.1116/1.2217982

M3 - Article

AN - SCOPUS:33748577737

SN - 0734-2101

VL - 24

SP - 1746

EP - 1750

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 5

ER -

Chemical and optical properties of thermally evaporated manganese oxide thin films

Abstract

Bibliographical note

ASJC Scopus subject areas

Access to Document

Fingerprint

Cite this