Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

M. Kawwam; F. H. Alharbi; T. Kayed; A. Aldwayyan; A. Alyamani; N. Tabet; K. Lebbou

doi:10.1016/j.apsusc.2013.02.051

Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

M. Kawwam^*
, F. H. Alharbi
, T. Kayed
, A. Aldwayyan
, A. Alyamani
, N. Tabet
, K. Lebbou

^*Corresponding author for this work

King Fahd University of Petroleum & Minerals

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

Original language	English
Pages (from-to)	7-12
Number of pages	6
Journal	Applied Surface Science
Volume	276
DOIs	https://doi.org/10.1016/j.apsusc.2013.02.051
State	Published - 1 Jul 2013

Bibliographical note

Funding Information:
This work was supported by King Abdulaziz City for Science and Technology . The authors also thank Dr. Solomon Kolagani from NEOCERA Inc., USA, and Prof. Mahmoud Korek from Beirut Arab University, Lebanon and Prof. Malek Tabbal from American University of Beirut, Lebanon for the fruitful discussions.

Keywords

Background
CuO/MgO
Optoelectronic
PLD
Pulsed laser deposition
Thin film

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
General Physics and Astronomy
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/j.apsusc.2013.02.051

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@article{e0f5c0b0a0754c6fb45ec240e80691ea,

title = "Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds",

abstract = "Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.",

keywords = "Background, CuO/MgO, Optoelectronic, PLD, Pulsed laser deposition, Thin film",

author = "M. Kawwam and Alharbi, \{F. H.\} and T. Kayed and A. Aldwayyan and A. Alyamani and N. Tabet and K. Lebbou",

note = "Funding Information: This work was supported by King Abdulaziz City for Science and Technology . The authors also thank Dr. Solomon Kolagani from NEOCERA Inc., USA, and Prof. Mahmoud Korek from Beirut Arab University, Lebanon and Prof. Malek Tabbal from American University of Beirut, Lebanon for the fruitful discussions.",

year = "2013",

month = jul,

day = "1",

doi = "10.1016/j.apsusc.2013.02.051",

language = "English",

volume = "276",

pages = "7--12",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

AU - Kawwam, M.

AU - Alharbi, F. H.

AU - Kayed, T.

AU - Aldwayyan, A.

AU - Alyamani, A.

AU - Tabet, N.

AU - Lebbou, K.

N1 - Funding Information: This work was supported by King Abdulaziz City for Science and Technology . The authors also thank Dr. Solomon Kolagani from NEOCERA Inc., USA, and Prof. Mahmoud Korek from Beirut Arab University, Lebanon and Prof. Malek Tabbal from American University of Beirut, Lebanon for the fruitful discussions.

PY - 2013/7/1

Y1 - 2013/7/1

N2 - Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

AB - Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

KW - Background

KW - CuO/MgO

KW - Optoelectronic

KW - PLD

KW - Pulsed laser deposition

KW - Thin film

UR - https://www.scopus.com/pages/publications/84877575482

U2 - 10.1016/j.apsusc.2013.02.051

DO - 10.1016/j.apsusc.2013.02.051

M3 - Article

AN - SCOPUS:84877575482

SN - 0169-4332

VL - 276

SP - 7

EP - 12

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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