Characterization of copper oxide thin films deposited by the thermal evaporation of cuprous oxide (Cu2O)

M. F. Al-Kuhaili

doi:10.1016/j.vacuum.2007.10.004

Characterization of copper oxide thin films deposited by the thermal evaporation of cuprous oxide (Cu₂O)

M. F. Al-Kuhaili^*

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Article › peer-review

209 Scopus citations

Abstract

Thin films of copper oxide were deposited by thermal evaporation of cuprous oxide (Cu₂O) powder. The substrates were either unheated or heated to a temperature of 300 °C. The films were also annealed in air at a temperature of 500 °C for 3 h. The films were characterized by X-ray photoelectron spectroscopy, X-ray diffraction and UV-visible spectrophotometry. The effects of the substrate temperature and post-deposition annealing on the chemical, structural and optical properties of the films were investigated. As-deposited films on unheated substrates consisted of mixed cupric oxide (CuO) and Cu₂O phases, with a higher concentration of the Cu₂O phase. However, the films deposited on heated substrates and the annealed films were predominantly of the CuO phase.

Original language	English
Pages (from-to)	623-629
Number of pages	7
Journal	Vacuum
Volume	82
Issue number	6
DOIs	https://doi.org/10.1016/j.vacuum.2007.10.004
State	Published - 19 Feb 2008

Bibliographical note

Funding Information:
The author acknowledges the support of this work by the Physics Department and the Research Institute of King Fahd University of Petroleum and Minerals.

Keywords

Annealing
Chemical properties
Copper oxide
Cupric oxide
Cuprous oxide
Optical properties
Structural properties
Thermal evaporation

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

Access to Document

10.1016/j.vacuum.2007.10.004

Cite this

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title = "Characterization of copper oxide thin films deposited by the thermal evaporation of cuprous oxide (Cu2O)",

abstract = "Thin films of copper oxide were deposited by thermal evaporation of cuprous oxide (Cu2O) powder. The substrates were either unheated or heated to a temperature of 300 °C. The films were also annealed in air at a temperature of 500 °C for 3 h. The films were characterized by X-ray photoelectron spectroscopy, X-ray diffraction and UV-visible spectrophotometry. The effects of the substrate temperature and post-deposition annealing on the chemical, structural and optical properties of the films were investigated. As-deposited films on unheated substrates consisted of mixed cupric oxide (CuO) and Cu2O phases, with a higher concentration of the Cu2O phase. However, the films deposited on heated substrates and the annealed films were predominantly of the CuO phase.",

keywords = "Annealing, Chemical properties, Copper oxide, Cupric oxide, Cuprous oxide, Optical properties, Structural properties, Thermal evaporation",

author = "Al-Kuhaili, \{M. F.\}",

note = "Funding Information: The author acknowledges the support of this work by the Physics Department and the Research Institute of King Fahd University of Petroleum and Minerals. ",

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T1 - Characterization of copper oxide thin films deposited by the thermal evaporation of cuprous oxide (Cu2O)

AU - Al-Kuhaili, M. F.

N1 - Funding Information: The author acknowledges the support of this work by the Physics Department and the Research Institute of King Fahd University of Petroleum and Minerals.

PY - 2008/2/19

Y1 - 2008/2/19

N2 - Thin films of copper oxide were deposited by thermal evaporation of cuprous oxide (Cu2O) powder. The substrates were either unheated or heated to a temperature of 300 °C. The films were also annealed in air at a temperature of 500 °C for 3 h. The films were characterized by X-ray photoelectron spectroscopy, X-ray diffraction and UV-visible spectrophotometry. The effects of the substrate temperature and post-deposition annealing on the chemical, structural and optical properties of the films were investigated. As-deposited films on unheated substrates consisted of mixed cupric oxide (CuO) and Cu2O phases, with a higher concentration of the Cu2O phase. However, the films deposited on heated substrates and the annealed films were predominantly of the CuO phase.

AB - Thin films of copper oxide were deposited by thermal evaporation of cuprous oxide (Cu2O) powder. The substrates were either unheated or heated to a temperature of 300 °C. The films were also annealed in air at a temperature of 500 °C for 3 h. The films were characterized by X-ray photoelectron spectroscopy, X-ray diffraction and UV-visible spectrophotometry. The effects of the substrate temperature and post-deposition annealing on the chemical, structural and optical properties of the films were investigated. As-deposited films on unheated substrates consisted of mixed cupric oxide (CuO) and Cu2O phases, with a higher concentration of the Cu2O phase. However, the films deposited on heated substrates and the annealed films were predominantly of the CuO phase.

KW - Annealing

KW - Chemical properties

KW - Copper oxide

KW - Cupric oxide

KW - Cuprous oxide

KW - Optical properties

KW - Structural properties

KW - Thermal evaporation

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