Abstract
A transverse-magnetic-pass (TM-pass) optical polarizer based on Cu complementary metal-oxide-semiconductor technology platform is proposed and analyzed using the 2-D method-of-lines numerical model. In designing the optimum configuration for the polarizer, it was found that the metal-insulator-metal (MIM) polarizer structure is superior compared to the insulator-metal-insulator polarizer structure due to its higher polarization extinction ratio (PER) and low insertion loss. An optimized MIM TM-pass polarizer exhibits simulated long wavelength pass filter characteristics of > ∼1.2 μm, with fundamental TM 0 and TE 0 mode transmissivity of >70% and <5%, respectively, and with PER ∼11.5 dB in the wavelength range of 1.2-1.6 μm. The subwavelength and submicrometer features of this TM-polarizer are potentially suitable for compact and low power photonics integrated circuit implementation on silicon-based substrates.
| Original language | English |
|---|---|
| Article number | 6151033 |
| Pages (from-to) | 724-726 |
| Number of pages | 3 |
| Journal | IEEE Photonics Technology Letters |
| Volume | 24 |
| Issue number | 9 |
| DOIs | |
| State | Published - 2012 |
| Externally published | Yes |
Bibliographical note
Funding Information:Manuscript received Oct 29, 2011; revised January 31, 2012; accepted February 2, 2012. Date of publication February 10, 2012; date of current version April 4, 2012. This work was supported in part by KAUST - University of Michigan Academic Excellence Alliance Grant 2010.
Keywords
- Complementary metal-oxide-semiconductor compatible
- integrated photonics
- numerical method
- optical polarizer
- silicon photonics
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering