Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material

A. K.Mahmud Hasan; Itaru Raifuku; N. Amin; Yasuaki Ishikawa; D. K. Sarkar; K. Sobayel; Mohammad R. Karim; Anwar Ul-Hamid; H. Abdullah; Md Shahiduzzaman; Yukiharu Uraoka; Kamaruzzaman Sopian; Md Akhtaruzzaman

doi:10.1364/OME.391321

Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material

A. K.Mahmud Hasan, Itaru Raifuku, N. Amin, Yasuaki Ishikawa, D. K. Sarkar, K. Sobayel, Mohammad R. Karim, Anwar Ul-Hamid, H. Abdullah, Md Shahiduzzaman, Yukiharu Uraoka, Kamaruzzaman Sopian, Md Akhtaruzzaman^*

^*Corresponding author for this work

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Abstract

The electron-beam physical vapor deposition (EBPVD) technique was selected for nickel oxide (NiOx) film deposition at room temperatures. NiOx film (18 nm thick) was deposited as a hole transporting material (HTM) for inverted perovskite solar cells (PSCs) onto a fluorine-doped tin oxide (FTO)-coated glass substrate at a chamber vacuum pressure of 4.6104 Pa. PSCs were fabricated as a glass/FTO/NiOx(HTM)/CH3NH3PbI3/PC61BM/BCP/Ag structure with as-deposited and annealed (500 °C for 30 min) NiOx films. Under 100 mW cm2 illumination, as-deposited and annealed NiOx as HTM in PSCs (0.16 cm2) showed a high-power conversion efficiency (PCE) of 13.20% and 13.24%, respectively. The as-deposited and annealed PSCs retained 72.2% and 76.96% of their initial efficiency in ambient conditions, correspondingly. This study highlights the possibility of achieving highly crystalline and finely disseminated NiOx films by EBPVD for fabricating efficient inverted PSCs.

Original language	English
Pages (from-to)	1801-1816
Number of pages	16
Journal	Optical Materials Express
Volume	10
Issue number	10
DOIs	https://doi.org/10.1364/OME.391321
State	Published - 1 Aug 2020

Bibliographical note

Publisher Copyright:
© 2020 Optical Society of America.

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

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Hasan, A. K. M., Raifuku, I., Amin, N., Ishikawa, Y., Sarkar, D. K., Sobayel, K., Karim, M. R., Ul-Hamid, A., Abdullah, H., Shahiduzzaman, M., Uraoka, Y., Sopian, K., & Akhtaruzzaman, M. (2020). Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material. Optical Materials Express, 10(10), 1801-1816. https://doi.org/10.1364/OME.391321

@article{28d1c255083f40d58df4400e274bdf1d,

title = "Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material",

abstract = "The electron-beam physical vapor deposition (EBPVD) technique was selected for nickel oxide (NiOx) film deposition at room temperatures. NiOx film (18 nm thick) was deposited as a hole transporting material (HTM) for inverted perovskite solar cells (PSCs) onto a fluorine-doped tin oxide (FTO)-coated glass substrate at a chamber vacuum pressure of 4.6104 Pa. PSCs were fabricated as a glass/FTO/NiOx(HTM)/CH3NH3PbI3/PC61BM/BCP/Ag structure with as-deposited and annealed (500 °C for 30 min) NiOx films. Under 100 mW cm2 illumination, as-deposited and annealed NiOx as HTM in PSCs (0.16 cm2) showed a high-power conversion efficiency (PCE) of 13.20\% and 13.24\%, respectively. The as-deposited and annealed PSCs retained 72.2\% and 76.96\% of their initial efficiency in ambient conditions, correspondingly. This study highlights the possibility of achieving highly crystalline and finely disseminated NiOx films by EBPVD for fabricating efficient inverted PSCs.",

author = "Hasan, \{A. K.Mahmud\} and Itaru Raifuku and N. Amin and Yasuaki Ishikawa and Sarkar, \{D. K.\} and K. Sobayel and Karim, \{Mohammad R.\} and Anwar Ul-Hamid and H. Abdullah and Md Shahiduzzaman and Yukiharu Uraoka and Kamaruzzaman Sopian and Md Akhtaruzzaman",

note = "Publisher Copyright: {\textcopyright} 2020 Optical Society of America.",

year = "2020",

month = aug,

day = "1",

doi = "10.1364/OME.391321",

language = "English",

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Hasan, AKM, Raifuku, I, Amin, N, Ishikawa, Y, Sarkar, DK, Sobayel, K, Karim, MR, Ul-Hamid, A, Abdullah, H, Shahiduzzaman, M, Uraoka, Y, Sopian, K & Akhtaruzzaman, M 2020, 'Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material', Optical Materials Express, vol. 10, no. 10, pp. 1801-1816. https://doi.org/10.1364/OME.391321

TY - JOUR

T1 - Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material

AU - Hasan, A. K.Mahmud

AU - Raifuku, Itaru

AU - Amin, N.

AU - Ishikawa, Yasuaki

AU - Sarkar, D. K.

AU - Sobayel, K.

AU - Karim, Mohammad R.

AU - Ul-Hamid, Anwar

AU - Abdullah, H.

AU - Shahiduzzaman, Md

AU - Uraoka, Yukiharu

AU - Sopian, Kamaruzzaman

AU - Akhtaruzzaman, Md

PY - 2020/8/1

Y1 - 2020/8/1

N2 - The electron-beam physical vapor deposition (EBPVD) technique was selected for nickel oxide (NiOx) film deposition at room temperatures. NiOx film (18 nm thick) was deposited as a hole transporting material (HTM) for inverted perovskite solar cells (PSCs) onto a fluorine-doped tin oxide (FTO)-coated glass substrate at a chamber vacuum pressure of 4.6104 Pa. PSCs were fabricated as a glass/FTO/NiOx(HTM)/CH3NH3PbI3/PC61BM/BCP/Ag structure with as-deposited and annealed (500 °C for 30 min) NiOx films. Under 100 mW cm2 illumination, as-deposited and annealed NiOx as HTM in PSCs (0.16 cm2) showed a high-power conversion efficiency (PCE) of 13.20% and 13.24%, respectively. The as-deposited and annealed PSCs retained 72.2% and 76.96% of their initial efficiency in ambient conditions, correspondingly. This study highlights the possibility of achieving highly crystalline and finely disseminated NiOx films by EBPVD for fabricating efficient inverted PSCs.

AB - The electron-beam physical vapor deposition (EBPVD) technique was selected for nickel oxide (NiOx) film deposition at room temperatures. NiOx film (18 nm thick) was deposited as a hole transporting material (HTM) for inverted perovskite solar cells (PSCs) onto a fluorine-doped tin oxide (FTO)-coated glass substrate at a chamber vacuum pressure of 4.6104 Pa. PSCs were fabricated as a glass/FTO/NiOx(HTM)/CH3NH3PbI3/PC61BM/BCP/Ag structure with as-deposited and annealed (500 °C for 30 min) NiOx films. Under 100 mW cm2 illumination, as-deposited and annealed NiOx as HTM in PSCs (0.16 cm2) showed a high-power conversion efficiency (PCE) of 13.20% and 13.24%, respectively. The as-deposited and annealed PSCs retained 72.2% and 76.96% of their initial efficiency in ambient conditions, correspondingly. This study highlights the possibility of achieving highly crystalline and finely disseminated NiOx films by EBPVD for fabricating efficient inverted PSCs.

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DO - 10.1364/OME.391321

M3 - Article

AN - SCOPUS:85089147229

SN - 2159-3930

VL - 10

SP - 1801

EP - 1816

JO - Optical Materials Express

JF - Optical Materials Express

IS - 10

ER -

Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material

Abstract

Bibliographical note

ASJC Scopus subject areas

UN SDGs

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