A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

Jitendra Menda; Lakshman Kumar Vanga; Benjamin Ulmen; Yoke Khin Yap; Pan Zhengwei; Ilia N. Ivanov; Alex A. Puretzky; David B. Geohegan

doi:10.1557/proc-858-hh3.11

A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

Jitendra Menda^*
, Lakshman Kumar Vanga
, Benjamin Ulmen
, Yoke Khin Yap
, Pan Zhengwei
, Ilia N. Ivanov
, Alex A. Puretzky
, David B. Geohegan

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.

Original language	English
Title of host publication	Functional Carbon Nanotubes
Publisher	Materials Research Society
Pages	69-75
Number of pages	7
ISBN (Print)	1558998101, 9781558998100
DOIs	https://doi.org/10.1557/proc-858-hh3.11
State	Published - 2004
Externally published	Yes

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	858
ISSN (Print)	0272-9172

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/proc-858-hh3.11

Cite this

Menda, J., Kumar Vanga, L., Ulmen, B., Yap, Y. K., Zhengwei, P., Ivanov, I. N., Puretzky, A. A., & Geohegan, D. B. (2004). A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes. In Functional Carbon Nanotubes (pp. 69-75). (Materials Research Society Symposium Proceedings; Vol. 858). Materials Research Society. https://doi.org/10.1557/proc-858-hh3.11

@inproceedings{88ee8c6516614da4bcbf953716aacacd,

title = "A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes",

abstract = "Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.",

author = "Jitendra Menda and \{Kumar Vanga\}, Lakshman and Benjamin Ulmen and Yap, \{Yoke Khin\} and Pan Zhengwei and Ivanov, \{Ilia N.\} and Puretzky, \{Alex A.\} and Geohegan, \{David B.\}",

year = "2004",

doi = "10.1557/proc-858-hh3.11",

language = "English",

isbn = "1558998101",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "69--75",

booktitle = "Functional Carbon Nanotubes",

}

Menda, J, Kumar Vanga, L, Ulmen, B, Yap, YK, Zhengwei, P, Ivanov, IN, Puretzky, AA & Geohegan, DB 2004, A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes. in Functional Carbon Nanotubes. Materials Research Society Symposium Proceedings, vol. 858, Materials Research Society, pp. 69-75. https://doi.org/10.1557/proc-858-hh3.11

A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes. / Menda, Jitendra; Kumar Vanga, Lakshman; Ulmen, Benjamin et al.
Functional Carbon Nanotubes. Materials Research Society, 2004. p. 69-75 (Materials Research Society Symposium Proceedings; Vol. 858).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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T1 - A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

AU - Menda, Jitendra

AU - Kumar Vanga, Lakshman

AU - Ulmen, Benjamin

AU - Yap, Yoke Khin

AU - Zhengwei, Pan

AU - Ivanov, Ilia N.

AU - Puretzky, Alex A.

AU - Geohegan, David B.

PY - 2004

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N2 - Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.

AB - Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.

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U2 - 10.1557/proc-858-hh3.11

DO - 10.1557/proc-858-hh3.11

M3 - Conference contribution

AN - SCOPUS:34249940753

SN - 1558998101

SN - 9781558998100

T3 - Materials Research Society Symposium Proceedings

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BT - Functional Carbon Nanotubes

PB - Materials Research Society

ER -

A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

Abstract

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ASJC Scopus subject areas

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