Abstract
This work reports a high-power modulator implemented in 45-nm CMOS SOI for signal processing after the power amplifier. Two stacked switch variations, a 12 stack and 8 stack, were designed in 45-nm SOI CMOS and tested for trade-offs in insertion loss and power handling. These switches use a novel tapering technique to significantly improve switch linearity. The modulators have P1dB values between 34 dBm and 39 dBm while demonstrating a modulation bandwidth of nearly 500 MHz with a 1 GHz carrier. The IIP3 is between 46 dBm and 61 dBm.
Original language | English |
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Title of host publication | 2019 IEEE MTT-S International Microwave Symposium, IMS 2019 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 243-246 |
Number of pages | 4 |
ISBN (Electronic) | 9781728113098 |
DOIs | |
State | Published - Jun 2019 |
Publication series
Name | IEEE MTT-S International Microwave Symposium Digest |
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Volume | 2019-June |
ISSN (Print) | 0149-645X |
Bibliographical note
Publisher Copyright:© 2019 IEEE.
Keywords
- High Power
- Phase-shifter
- RF Switch
- SOI CMOS
ASJC Scopus subject areas
- Radiation
- Condensed Matter Physics
- Electrical and Electronic Engineering